Metallization of a thiol-terminated organic surface using chemical vapor deposition
The deposition and the subsequent decomposition of an organometallic precursor, (eta (3)-allyl)(eta (5)-cyclopentadienyl)palladium [Cp(allyl)Pd], on an organic surface exposed by self-assembled monolayers (SAM) was studied using X-ray photoelectron spectroscopy (XPS) and infrared reflection absorpti...
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Détails bibliographiques
| Publié dans: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 24(2008), 15 vom: 05. Aug., Seite 7986-94
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| Auteur principal: |
Rajalingam, Ketheeswari
(Auteur) |
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| Autres auteurs: |
Strunskus, Thomas,
Terfort, Andreas,
Fischer, Roland A,
Wöll, Christof |
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| Format: | Article en ligne
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| Langue: | English |
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| Publié: |
2008
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| Accès à la collection: | Langmuir : the ACS journal of surfaces and colloids
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| Sujets: | Journal Article |
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