High-energy electron beam lithography of octadecylphosphonic acid monolayers on aluminum

Monolayers of octadecylphosphonic acid were self-assembled on silicon substrates sputter coated with aluminum. Patterning of the self-assembled monolayer was achieved by high-energy electron (50 kV) illumination using an electron beam lithography tool. The change in chemical composition of the expos...

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Veröffentlicht in:	Langmuir : the ACS journal of surfaces and colloids. - 1992. - 24(2008), 5 vom: 04. März, Seite 2057-63
1. Verfasser:	Gadegaard, Nikolaj (VerfasserIn)
Weitere Verfasser:	Chen, Xinyong, Rutten, Frank J M, Alexander, Morgan R
Format:	Online-Aufsatz
Sprache:	English
Veröffentlicht:	2008
Zugriff auf das übergeordnete Werk:	Langmuir : the ACS journal of surfaces and colloids
Schlagworte:	Journal Article Organophosphonates Aluminum CPD4NFA903 Silicon Z4152N8IUI