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|a pubmed24n0583.xml
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|a (DE-627)NLM174877463
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|a (NLM)17988159
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Ji, Qiang
|e verfasserin
|4 aut
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|a Facile approach to the fabrication of a micropattern possessing nanoscale substructure
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|c 2007
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|a Text
|b txt
|2 rdacontent
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|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
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|a Band
|b nc
|2 rdacarrier
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|a Date Completed 08.01.2008
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|a Date Revised 15.11.2012
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|a published: Print-Electronic
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|a Citation Status MEDLINE
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|a On the basis of the combined technologies of photolithography and reaction-induced phase separation (RIPS), a facile approach has been successfully developed for the fabrication of a micropattern possessing nanoscale substructure on the thin film surface. This approach involves three steps. In the first step, a thin film was prepared by spin coating from a solution of a commercial random copolymer, polystyrene-r-poly(methyl methacrylate) (PS-r-PMMA) and a commercial crosslinker, trimethylolpropane triacrylate (TMPTA). In the second step, photolithograph was performed with the thin film using a 250 W high-pressure mercury lamp to produce the micropattern. Finally, the resulting micropattern was annealed at 200 degrees C for a certain time, and reaction-induced phase separation occurred. After soaking in chloroform for 4 h, nanoscale substructure was obtained. The whole processes were traced by atomic force microscopy (AFM), X-ray photoelectron spectrometry (XPS), and Fourier transform infrared (FTIR) spectroscopy, and the results supported the proposed structure
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|a Journal Article
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|a Research Support, Non-U.S. Gov't
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|a Acrylates
|2 NLM
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|a Membranes, Artificial
|2 NLM
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|a Methacrylates
|2 NLM
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|a Polystyrenes
|2 NLM
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|a polystyrene-block-poly(methyl methacrylate)
|2 NLM
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|a trimethylolpropane triacrylate
|2 NLM
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|a 4B67KGL96S
|2 NLM
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|a Jiang, Xuesong
|e verfasserin
|4 aut
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|a Yin, Jie
|e verfasserin
|4 aut
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 23(2007), 25 vom: 04. Dez., Seite 12663-8
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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|g volume:23
|g year:2007
|g number:25
|g day:04
|g month:12
|g pages:12663-8
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|a GBV_USEFLAG_A
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|a SYSFLAG_A
|
912 |
|
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|a GBV_NLM
|
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|
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|a GBV_ILN_22
|
912 |
|
|
|a GBV_ILN_350
|
912 |
|
|
|a GBV_ILN_721
|
951 |
|
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|a AR
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952 |
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|d 23
|j 2007
|e 25
|b 04
|c 12
|h 12663-8
|