Facile approach to the fabrication of a micropattern possessing nanoscale substructure
On the basis of the combined technologies of photolithography and reaction-induced phase separation (RIPS), a facile approach has been successfully developed for the fabrication of a micropattern possessing nanoscale substructure on the thin film surface. This approach involves three steps. In the f...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 23(2007), 25 vom: 04. Dez., Seite 12663-8 |
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| Weitere Verfasser: | , |
| Format: | Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2007
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article Research Support, Non-U.S. Gov't Acrylates Membranes, Artificial Methacrylates Polystyrenes polystyrene-block-poly(methyl methacrylate) trimethylolpropane triacrylate 4B67KGL96S |