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231223s2007 xx ||||| 00| ||eng c |
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Li, Zhiyong
|e verfasserin
|4 aut
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|a Plasma-induced formation of Ag nanodots for ultra-high-enhancement surface-enhanced Raman scattering substrates
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|c 2007
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|a Text
|b txt
|2 rdacontent
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|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
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|a Date Completed 12.06.2007
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|a Date Revised 21.11.2013
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|a published: Print-Electronic
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|a Citation Status MEDLINE
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|a We report here plasma-induced formation of Ag nanostructures for surface-enhanced Raman scattering (SERS) applications. An array of uniform Ag patterned structures of 150 nm diameter was first fabricated on a silicon substrate with imprint lithography; then the substrate was further treated with an oxygen plasma to fracture the patterned structures into clusters of smaller, interconnected, closely packed Ag nanoparticles (20-60 nm) and redeposited Ag nanodots ( approximately 10 nm) between the clusters. The substrate thus formed had a uniform ultrahigh SERS enhancement factor (1010) over the entire substrate for 4-mercaptophenol molecules. By comparison, Au patterned structures fabricated with the same method did not undergo such a morphological change after the plasma treatment and showed no enhancement of Raman scattering
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|a Journal Article
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|a Research Support, U.S. Gov't, Non-P.H.S.
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|a 4-mercaptophenol
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|a Phenols
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|a Sulfhydryl Compounds
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|a Silver
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|a Tong, William M
|e verfasserin
|4 aut
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|a Stickle, William F
|e verfasserin
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|a Neiman, David L
|e verfasserin
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|a Williams, R Stanley
|e verfasserin
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|a Hunter, Luke L
|e verfasserin
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|a Talin, A Alec
|e verfasserin
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|a Li, D
|e verfasserin
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|a Brueck, S R J
|e verfasserin
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 23(2007), 9 vom: 24. Apr., Seite 5135-8
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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|g volume:23
|g year:2007
|g number:9
|g day:24
|g month:04
|g pages:5135-8
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