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|a (DE-627)NLM160546877
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|a (NLM)16460108
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Mao, Yu
|e verfasserin
|4 aut
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|a Positive-tone nanopatterning of chemical vapor deposited polyacrylic thin films
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|c 2006
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|a Text
|b txt
|2 rdacontent
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|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
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|a Band
|b nc
|2 rdacarrier
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|a Date Completed 09.05.2007
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|a Date Revised 07.02.2006
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|a published: Print
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|a Citation Status PubMed-not-MEDLINE
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|a Terpolymers of methyl alpha-chloroacrylate (MCA), methacrylic acid (MAA), and methacrylic anhydride (MAH) were synthesized by initiated chemical vapor deposition (iCVD) of MCA and MAA followed by low-temperature annealing that partially converts MAA into MAH. The MAA composition in the iCVD copolymer can be systematically varied between 37 and 85 mol % by adjusting the gas feed fractions of monomers. Study of the monomer reactivity ratios and the copolymer molecular weights supports the hypothesis of a surface propagation mechanism during the iCVD copolymerization. The carboxylic dehydration reaction at the annealing temperature of 160 degrees C is dominated by a mechanism of intramolecular cyclization, resulting in intramolecular MAH anhydride formation while preventing crosslink formation. The incorporation of highly electron-withdrawing anhydride functionality enhances chain scission susceptibility under electron-beam irradiation. P(MCA-MAA-MAH) terpolymer thin films can be completely developed at dosages as low as 20 microC/cm2 at 50 kV. High-quality positive-tone patterns were created with 60 nm feature size achieved in the vapor deposited films
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|a Journal Article
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|a Gleason, Karen K
|e verfasserin
|4 aut
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 22(2006), 4 vom: 14. Feb., Seite 1795-9
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|x 1520-5827
|7 nnns
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|g volume:22
|g year:2006
|g number:4
|g day:14
|g month:02
|g pages:1795-9
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|d 22
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