Stamp collapse in soft lithography

We have studied the so-called roof collapse in soft lithography. Roof collapse is due to the adhesion between the PDMS stamp and substrate, and it may affect the quality of soft lithography. Our analysis accounts for the interactions of multiple punches and the effect of elastic mismatch between the...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 21(2005), 17 vom: 16. Aug., Seite 8058-68
1. Verfasser: Huang, Yonggang Y (VerfasserIn)
Weitere Verfasser: Zhou, Weixing, Hsia, K J, Menard, Etienne, Park, Jang-Ung, Rogers, John A, Alleyne, Andrew G
Format: Aufsatz
Sprache:English
Veröffentlicht: 2005
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article
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245 1 0 |a Stamp collapse in soft lithography 
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520 |a We have studied the so-called roof collapse in soft lithography. Roof collapse is due to the adhesion between the PDMS stamp and substrate, and it may affect the quality of soft lithography. Our analysis accounts for the interactions of multiple punches and the effect of elastic mismatch between the PDMS stamp and substrate. A scaling law among the stamp modulus, punch height and spacing, and work of adhesion between the stamp and substrate is established. Such a scaling law leads to a simple criterion against the unwanted roof collapse. The present study agrees well with the experimental data 
650 4 |a Journal Article 
700 1 |a Zhou, Weixing  |e verfasserin  |4 aut 
700 1 |a Hsia, K J  |e verfasserin  |4 aut 
700 1 |a Menard, Etienne  |e verfasserin  |4 aut 
700 1 |a Park, Jang-Ung  |e verfasserin  |4 aut 
700 1 |a Rogers, John A  |e verfasserin  |4 aut 
700 1 |a Alleyne, Andrew G  |e verfasserin  |4 aut 
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