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231223s2004 xx ||||| 00| ||eng c |
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|a (NLM)15875412
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|e rakwb
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|a eng
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| 100 |
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|a Mendes, Paula M
|e verfasserin
|4 aut
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| 245 |
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|a Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography
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|c 2004
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|a Text
|b txt
|2 rdacontent
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|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
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|b nc
|2 rdacarrier
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|a Date Completed 09.02.2006
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|a Date Revised 26.10.2019
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|a published: Print
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|a Citation Status PubMed-not-MEDLINE
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|a This paper demonstrates a novel facile method for fabrication of patterned arrays of gold nanoparticles on Si/SiO2 by combining electron beam lithography and self-assembly techniques. Our strategy is to use direct-write electron beam patterning to convert nitro functionality in self-assembled monolayers of 3-(4-nitrophenoxy)-propyltrimethoxysilane to amino functionality, forming chemically well-defined surface architectures on the 100 nm scale. These nanopatterns are employed to guide the assembly of citrate-passivated gold nanoparticles according to their different affinities for amino and nitro groups. This kind of nanoparticle assembly offers an attractive new option for nanoparticle patterning a silicon surface, as relevant, for example, to biosensors, electronics, and optical devices
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|a Journal Article
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|a Jacke, Susanne
|e verfasserin
|4 aut
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|a Critchley, Kevin
|e verfasserin
|4 aut
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|a Plaza, Jose
|e verfasserin
|4 aut
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|a Chen, Yu
|e verfasserin
|4 aut
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|a Nikitin, Kirill
|e verfasserin
|4 aut
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| 700 |
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|a Palmer, Richard E
|e verfasserin
|4 aut
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|a Preece, Jon A
|e verfasserin
|4 aut
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|a Evans, Stephen D
|e verfasserin
|4 aut
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|a Fitzmaurice, Donald
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 20(2004), 9 vom: 27. Apr., Seite 3766-8
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|x 1520-5827
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|g year:2004
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|g day:27
|g month:04
|g pages:3766-8
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