X-ray absorption spectroscopy to probe surface composition and surface deprotection in photoresist films

Near-edge X-ray absorption fine structure spectroscopy (NEXAFS) is utilized to provide insight into surface chemical effects in model photoresist films. First, NEXAFS was used to examine the resist/air interface including surface segregation of a photoacid generator (PAG) and the extent of surface d...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Langmuir : the ACS journal of surfaces and colloids. - 1992. - 21(2005), 9 vom: 26. Apr., Seite 4007-15
1. Verfasser:	Lenhart, Joseph L (VerfasserIn)
Weitere Verfasser:	Fischer, Daniel A, Sambasivan, Sharadha, Lin, Eric K, Jones, Ronald L, Soles, Christopher L, Wu, Wen-Li, Goldfarb, Dario L, Angelopoulos, Marie
Format:	Aufsatz
Sprache:	English
Veröffentlicht:	2005
Zugriff auf das übergeordnete Werk:	Langmuir : the ACS journal of surfaces and colloids
Schlagworte:	Journal Article