Modification of aliphatic self-assembled monolayers by free-radical-dominant plasma : the role of the plasma composition

Modification of octadecanethiolate self-assembled monolayers on Au by nitrogen-oxygen or argon-oxygen downstream microwave plasma with a low oxygen content (estimated below several percent) has been studied by synchrotron-based high-resolution X-ray photoelectron spectroscopy and water contact angle...

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Publié dans:Langmuir : the ACS journal of surfaces and colloids. - 1985. - 20(2004), 23 vom: 09. Nov., Seite 10093-9
Auteur principal: Weng, Chih-Chiang (Auteur)
Autres auteurs: Liao, Jiunn-Der, Wu, Yi-Te, Wang, Ming-Chen, Klauser, Ruth, Grunze, Michael, Zharnikov, Michael
Format: Article
Langue:English
Publié: 2004
Accès à la collection:Langmuir : the ACS journal of surfaces and colloids
Sujets:Journal Article
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Résumé:Modification of octadecanethiolate self-assembled monolayers on Au by nitrogen-oxygen or argon-oxygen downstream microwave plasma with a low oxygen content (estimated below several percent) has been studied by synchrotron-based high-resolution X-ray photoelectron spectroscopy and water contact angle measurements. For both types of plasma, the primary processes were found to be the loss of conformational and orientational order and the oxidation of the alkyl matrix and headgroup-substrate interface. At the same time, the film modification occurred much faster and with different intermediates for the nitrogen plasma than for the argon plasma. The reasons for these differences are considered in terms of the different reactivities and different efficiencies of the energy transfer between the plasma constituents in these two types of plasma
Description:Date Completed 10.04.2006
Date Revised 02.11.2004
published: Print
Citation Status PubMed-not-MEDLINE
ISSN:1520-5827