Anisotropic thermal expansion behavior of thin films of polymethylsilsesquioxane, a spin-on-glass dielectric for high-performance integrated circuits
Thin films of poly(methylsilsesquioxane) (PMSSQ) are candidates for use as interdielectric layers in advanced semiconductor devices with multilayer structures. We prepared thin films of PMSSQ with thicknesses in the range 25.0-1151.0 nm by spin-casting its soluble precursor onto Si and GaAs substrat...
| Publié dans: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 20(2004), 16 vom: 03. Aug., Seite 6932-9 |
|---|---|
| Auteur principal: | |
| Autres auteurs: | |
| Format: | Article |
| Langue: | English |
| Publié: |
2004
|
| Accès à la collection: | Langmuir : the ACS journal of surfaces and colloids |
| Sujets: | Journal Article |