Synchrotron-radiation-induced formation of salt particles on an X-ray lithography mask
The suppression and removal of contaminants on X-ray masks are required for the application of X-ray lithography to practical semiconductor production, because contamination is easily transferred to the replicated resist patterns and degrades the LSI patterns. In order to study contamination of a Ta...
| Publié dans: | Journal of synchrotron radiation. - 1994. - 5(1998), Pt 3 vom: 01. Mai, Seite 1141-3 |
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| Auteur principal: | |
| Autres auteurs: | , |
| Format: | Article |
| Langue: | English |
| Publié: |
1998
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| Accès à la collection: | Journal of synchrotron radiation |
| Sujets: | Journal Article |