Selection of Diacrylate Monomers for Sub-15 nm Ultraviolet Nanoimprinting by Resonance Shear Measurement

von Ito, Shunya
Veröffentlicht in: Langmuir : the ACS journal of surfaces and colloids (2018)

Selection of di(meth)acrylate monomers for low pollution of fluorinated mold surfaces in ultraviolet nanoimprint lithography

von Nakagawa, Masaru
Veröffentlicht in: Langmuir : the ACS journal of surfaces and colloids (2015)

Investigation of fluorinated (Meth)acrylate monomers and macromonomers suitable for a hydroxy-containing acrylate monomer in UV nanoimprinting

von Ito, Shunya
Veröffentlicht in: Langmuir : the ACS journal of surfaces and colloids (2014)