Selection of di(meth)acrylate monomers for low pollution of fluorinated mold surfaces in ultraviolet nanoimprint lithography
We used fluorescence microscopy to show that low adsorption of resin components by a mold surface was necessary for continuous ultraviolet (UV) nanoimprinting, as well as generation of a low release energy on detachment of a cured resin from a template mold. This is because with low mold pollution,...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 31(2015), 14 vom: 14. Apr., Seite 4188-95
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| 1. Verfasser: |
Nakagawa, Masaru
(VerfasserIn) |
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| Weitere Verfasser: |
Kobayashi, Kei,
Hattori, Azusa N,
Ito, Shunya,
Hiroshiba, Nobuya,
Kubo, Shoichi,
Tanaka, Hidekazu |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2015
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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