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250725s2025 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202506695
|2 doi
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|a pubmed25n1507.xml
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|a (DE-627)NLM390072273
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|a (NLM)40708338
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Henríquez-Guerra, Eudomar
|e verfasserin
|4 aut
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| 245 |
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|a Strain Engineering of Magnetoresistance and Magnetic Anisotropy in CrSBr
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|c 2025
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Revised 25.07.2025
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|a published: Print-Electronic
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|a Citation Status Publisher
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|a © 2025 The Author(s). Advanced Materials published by Wiley‐VCH GmbH.
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|a Tailoring magnetoresistance and magnetic anisotropy in van der Waals magnetic materials is essential for advancing their integration into technological applications. In this regard, strain engineering has emerged as a powerful and versatile strategy to control magnetism at the 2D limit. Here, it is demonstrated that compressive biaxial strain significantly enhances the magnetoresistance and magnetic anisotropy of few-layer CrSBr flakes. Strain is efficiently transferred to the flakes from the thermal compression of a polymeric substrate upon cooling, as confirmed by temperature-dependent Raman spectroscopy. This strain induces a remarkable increase in the magnetoresistance ratio and in the saturation fields required to align the magnetization of CrSBr along each of its three crystalographic directions, reaching a twofold enhancement along the magnetic easy axis. This enhancement is accompanied by a subtle reduction of the Néel temperature by ≈10 K. The experimental results are fully supported by first-principles calculations, which link the observed effects to a strain-driven modification in interlayer exchange coupling and magnetic anisotropy energy. These findings establish strain engineering as a key tool for fine-tuning magnetotransport properties in 2D magnetic semiconductors, paving the way for implementation in spintronics and information storage devices
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|a Journal Article
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|a CrSBr
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|a magnetic 2D materials
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| 650 |
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|a magnetic anisotropy
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|a magnetoresistance
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| 650 |
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4 |
|a strain engineering
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1 |
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|a Ruiz, Alberto M
|e verfasserin
|4 aut
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|a Galbiati, Marta
|e verfasserin
|4 aut
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|a Cortés-Flores, Álvaro
|e verfasserin
|4 aut
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1 |
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|a Brown, Daniel
|e verfasserin
|4 aut
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|a Zamora-Amo, Esteban
|e verfasserin
|4 aut
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|a Almonte, Lisa
|e verfasserin
|4 aut
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|a Shumilin, Andrei
|e verfasserin
|4 aut
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1 |
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|a Salvador-Sánchez, Juan
|e verfasserin
|4 aut
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1 |
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|a Pérez-Rodríguez, Ana
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Orue, Iñaki
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|4 aut
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1 |
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|a Cantarero, Andrés
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|a Castellanos-Gomez, Andres
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|4 aut
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1 |
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|a Mompeán, Federico
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|4 aut
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|a Garcia-Hernandez, Mar
|e verfasserin
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|a Navarro-Moratalla, Efrén
|e verfasserin
|4 aut
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|a Diez, Enrique
|e verfasserin
|4 aut
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|a Amado, Mario
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Baldoví, José J
|e verfasserin
|4 aut
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| 700 |
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|a Calvo, M Reyes
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g (2025) vom: 24. Juli, Seite e2506695
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnas
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| 773 |
1 |
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|g year:2025
|g day:24
|g month:07
|g pages:e2506695
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| 856 |
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|u http://dx.doi.org/10.1002/adma.202506695
|3 Volltext
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