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250508s2025 xx |||||o 00| ||eng c |
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|a 10.1021/acs.langmuir.4c04629
|2 doi
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|a pubmed25n1389.xml
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|a (DE-627)NLM387077553
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|a (NLM)40234203
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|a DE-627
|b ger
|c DE-627
|e rakwb
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| 041 |
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|a eng
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| 100 |
1 |
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|a Murase, Daiki
|e verfasserin
|4 aut
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| 245 |
1 |
0 |
|a All Dry Transfer Processes Utilizing Au Exfoliation for Predetermined Shapes of Transition Metal Dichalcogenide
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| 264 |
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1 |
|c 2025
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| 336 |
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|a Text
|b txt
|2 rdacontent
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| 337 |
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|a ƒaComputermedien
|b c
|2 rdamedia
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| 338 |
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Revised 29.04.2025
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a Two-dimensional (2D) materials have attracted significant attention owing to their exceptional electrical and optical properties. The high-quality monolayer 2D materials are usually fabricated by mechanical exfoliation from bulk single crystals using a scotch tape method, limiting the flake size and production yield. Extensive efforts have been made to increase the production yield and size by using an Au-assisted process, such as the modified mechanical exfoliation method. However, the wet-etching processes are inevitable in the scalable Au-assisted mechanical exfoliation method, which causes defect formation and unintentional contamination, leading to a quality decrease in the monolayer 2D material flakes. Here, we developed a Au-assisted all dry transfer method without any wet process for fabricating 2D materials and their van der Waals (vdW) heterostructures. The developed dry transfer technique using patterned Au substrates and h-BN on polymer stamps gives us a large area and designed shape of monolayer 2D materials and their vdW heterostructures with clean interfaces. It will be beneficial for building high-quality vdW heterostructures, allowing us to explore and develop more potential applications in electrical and optical devices based on monolayer 2D materials
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4 |
|a Journal Article
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| 700 |
1 |
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|a Shinokita, Keisuke
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Wakafuji, Yusai
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Onodera, Momoko
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Machida, Tomoki
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Watanabe, Kenji
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Taniguchi, Takashi
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Bi, Jianfeng
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zhou, Zhou
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zhao, Sihan
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Matsuda, Kazunari
|e verfasserin
|4 aut
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| 773 |
0 |
8 |
|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1985
|g 41(2025), 16 vom: 29. Apr., Seite 10099-10107
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnas
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| 773 |
1 |
8 |
|g volume:41
|g year:2025
|g number:16
|g day:29
|g month:04
|g pages:10099-10107
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| 856 |
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|u http://dx.doi.org/10.1021/acs.langmuir.4c04629
|3 Volltext
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|a AR
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|d 41
|j 2025
|e 16
|b 29
|c 04
|h 10099-10107
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