The First Kr-Selective Carbon Molecular Sieve for Inverse Adsorption of Krypton Over Xenon at Ambient Temperature

© 2024 Wiley‐VCH GmbH.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - (2024) vom: 04. Dez., Seite e2409474
1. Verfasser: Chen, Fuqiang (VerfasserIn)
Weitere Verfasser: Zheng, Fang, Huang, Xinlei, Chu, Zhe, Sun, Haoran, Yang, Liu, Yang, Qiwei, Zhang, Zhiguo, Ren, Qilong, Bao, Zongbi
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2024
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article adsorption separation carbon molecular sieve inverse adsorption krypton xenon
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520 |a The efficient adsorption-based separation of krypton (Kr) and xenon (Xe) is of paramount importance but is challenged by their similar physicochemical properties. While carbon adsorbents are theoretically promising for Kr/Xe sieving, practical success has remained elusive. Here, a series of ultramicroporous carbon molecular sieves synthesized from sucrose-derived hydrochar is reported. The study employs careful characterization and controlled thermal pyrolysis to tailor ultramicropore formation and elucidate the evolution of the carbon framework. The leading material, C-Suc-750, has an ideal pore size of ≈4.0 Å. In particular, C-Suc-750 has achieved a remarkable Kr/Xe uptake ratio of 39.3 at ambient conditions, setting a new benchmark for selective Kr adsorption and molecular sieving of Kr/Xe. Breakthrough experiments further confirm the superior molecular sieving performance of C-Suc-750, highlighting its potential for Kr recovery in nuclear waste treatment. Moreover, molecular dynamics (MD) simulations demonstrate the critical role of narrow slit-pore of the carbon molecular sieve in molecular sieving separation of Kr/Xe, providing insights into the mechanism driving this selectivity 
650 4 |a Journal Article 
650 4 |a adsorption separation 
650 4 |a carbon molecular sieve 
650 4 |a inverse adsorption 
650 4 |a krypton 
650 4 |a xenon 
700 1 |a Zheng, Fang  |e verfasserin  |4 aut 
700 1 |a Huang, Xinlei  |e verfasserin  |4 aut 
700 1 |a Chu, Zhe  |e verfasserin  |4 aut 
700 1 |a Sun, Haoran  |e verfasserin  |4 aut 
700 1 |a Yang, Liu  |e verfasserin  |4 aut 
700 1 |a Yang, Qiwei  |e verfasserin  |4 aut 
700 1 |a Zhang, Zhiguo  |e verfasserin  |4 aut 
700 1 |a Ren, Qilong  |e verfasserin  |4 aut 
700 1 |a Bao, Zongbi  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g (2024) vom: 04. Dez., Seite e2409474  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g year:2024  |g day:04  |g month:12  |g pages:e2409474 
856 4 0 |u http://dx.doi.org/10.1002/adma.202409474  |3 Volltext 
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