Fabrication of Ultrahigh-Loading Dual Copper Sites in Nitrogen-Doped Porous Carbons Boosting Electroreduction of CO2 to C2H4 Under Neutral Conditions
© 2024 Wiley‐VCH GmbH.
| Veröffentlicht in: | Advanced materials (Deerfield Beach, Fla.). - 1998. - (2024) vom: 16. Nov., Seite e2415101 |
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| Weitere Verfasser: | , , , |
| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2024
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| Zugriff auf das übergeordnete Werk: | Advanced materials (Deerfield Beach, Fla.) |
| Schlagworte: | Journal Article carbonization dual‐atom sites electroreduction of CO2, ethylene metal–organic frameworks |
| Zusammenfassung: | © 2024 Wiley‐VCH GmbH. Synthesis of high-loading atomic-level dispersed catalysts for highly efficient electrochemical CO2 reduction reaction (eCO2RR) to ethylene (C2H4) in neutral electrolyte remain challenging tasks. To address common aggregation issues, a host-guest strategy is employed, by using a metal-azolate framework (MAF-4) with nanocages as the host and a dinuclear Cu(I) complex as the guest, to form precursors for pyrolysis into a series of nitrogen-doped porous carbons (NPCs) with varying loadings of dual copper sites, namely NPCMAF-4-Cu2-21 (21.2 wt%), NPCMAF-4-Cu2-11 (10.6 wt%), and NPCMAF-4-Cu2-7 (6.9 wt%). Interestingly, as the loading of dual copper sites increased from 6.9 to 21.2 wt%, the partial current density for eCO2RR to yield C2H4 also gradually increased from 38.7 to 93.6 mA cm-2. In a 0.1 m KHCO3 electrolyte, at -1.4 V versus reversible hydrogen electrode (vs. RHE), NPCMAF-4-Cu2-21 exhibits the excellent performance with a Faradaic efficiency of 52% and a current density of 180 mA cm-2. Such performance can be attributed to the presence of ultrahigh-loading dual copper sites, which promotes C─C coupling and the formation of C2 products. The findings demonstrate the confinement effect of MAF-4 with nanocages is conducive to the preparation of high-loading atomic-level catalysts |
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| Beschreibung: | Date Revised 16.11.2024 published: Print-Electronic Citation Status Publisher |
| ISSN: | 1521-4095 |
| DOI: | 10.1002/adma.202415101 |