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241031s2024 xx |||||o 00| ||eng c |
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|a 10.1021/acs.langmuir.4c02644
|2 doi
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|a eng
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|a Li, Jinhui
|e verfasserin
|4 aut
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|a Study on the Adsorption Mechanism of Cu2+ by ZnAl-LDH-Containing Exchangeable Interlayer Chloride Ions
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|c 2024
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|a Text
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|a ƒaComputermedien
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|a Date Revised 30.10.2024
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|a published: Print-Electronic
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|a Citation Status Publisher
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|a Different Zn/Al ratios of Cl- intercalated ZnAl-layered double hydroxide (ZnAl-LDH) were prepared using the coprecipitation method, and their adsorption performance for Cu2+ in aqueous solution was evaluated. The factors affecting adsorption properties, such as dosage, reaction time, and pH, were determined by adsorption experiments. Then, the adsorption kinetics and isotherm models were fitted to evaluate the adsorption mechanism. The results show that the Zn/Al ratio has a great influence on the adsorption effect, the best adsorption effect is obtained when the Zn/Al ratio is 4:1, and the maximum adsorption capacity of Cu2+ is 213 mg/g. The mechanism study shows that the adsorption of Cu2+ by ZnAl-LDH is mainly an isomorphic substitution. Additionally, during the adsorption of CuSO4, the presence of SO42- undergoes interlayer anion exchange with Cl-, and the process of SO42- entering the interlayer facilitates the isomorphic substitution of Cu2+ and Zn2+. X-ray diffraction (XRD) analysis shows that as the Zn/Al ratio increases, the interlayer spacing of ZnAl-LDH increases, and the crystallinity decreases. The adsorption process conforms to the pseudo-second-order kinetic process and the Langmuir isotherm adsorption model. Therefore, the adsorption type of ZnAl-LDH for Cu2+ is monolayer chemical adsorption. The adsorption thermodynamic results indicate that the adsorption of Cu2+ is a spontaneous endothermic process. The research results revealed the mechanism of ZnAl-LDH adsorbing Cu2+, providing ideas for removing and recovering copper-containing electroplating wastewater
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|a Journal Article
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|a Wei, Yuming
|e verfasserin
|4 aut
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|a Zou, Laixi
|e verfasserin
|4 aut
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1 |
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|a Li, Shuaidong
|e verfasserin
|4 aut
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| 700 |
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|a Luo, Yue
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1999
|g (2024) vom: 30. Okt.
|w (DE-627)NLM098181009
|x 1520-5827
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|g year:2024
|g day:30
|g month:10
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|u http://dx.doi.org/10.1021/acs.langmuir.4c02644
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