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241027s2024 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202410650
|2 doi
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|a pubmed24n1629.xml
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|a (NLM)39460439
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|a DE-627
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|a eng
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|a Sun, FuYao
|e verfasserin
|4 aut
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|a A Versatile Microporous Design toward Toughened yet Softened Self-Healing Materials
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|c 2024
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|a Date Revised 12.12.2024
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2024 Wiley‐VCH GmbH.
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|a Realizing the full potential of self-healing materials in stretchable electronics necessitates not only low modulus to enable high adaptivity, but also high toughness to resist crack propagation. However, existing toughening strategies for soft self-healing materials have only modestly improves mechanical dissipation near the crack tip (ГD), and invariably compromise the material's inherent softness and autonomous healing capabilities. Here, a synthetic microporous architecture is demonstrated that unprecedently toughens and softens self-healing materials without impacting their intrinsic self-healing kinetics. This microporous structure spreads energy dissipation across the entire material through a bran-new dissipative mode of adaptable crack movement (ГA), which substantially increases the fracture toughness by 31.6 times, from 3.19 to 100.86 kJ m-2, and the fractocohesive length by 20.7 times, from 0.59 mm to 12.24 mm. This combination of unprecedented fracture toughness (100.86 kJ m-2) and centimeter-scale fractocohesive length (1.23 cm) surpasses all previous records for synthetic soft self-healing materials and even exceeds those of light alloys. Coupled with significantly enhanced softness (0.43 MPa) and nearly perfect autonomous self-healing efficiency (≈100%), this robust material is ideal for constructing durable kirigami electronics for wearable devices
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|a Journal Article
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|a autonomous self‐healing
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|a closed microporous structure
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|a fractocohesive length
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|a kirigami electronics
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|a toughening yet softening
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|a Zhang, JingYi
|e verfasserin
|4 aut
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|a Liu, Tong
|e verfasserin
|4 aut
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1 |
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|a Yao, Hai
|e verfasserin
|4 aut
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|a Wang, Lin
|e verfasserin
|4 aut
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|a Meng, HengYu
|e verfasserin
|4 aut
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|a Gao, YunLong
|e verfasserin
|4 aut
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|a Cao, YanFeng
|e verfasserin
|4 aut
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|a Yao, BoWen
|e verfasserin
|4 aut
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|a Xu, JianHua
|e verfasserin
|4 aut
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|a Fu, JiaJun
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 36(2024), 50 vom: 14. Dez., Seite e2410650
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:36
|g year:2024
|g number:50
|g day:14
|g month:12
|g pages:e2410650
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|u http://dx.doi.org/10.1002/adma.202410650
|3 Volltext
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