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241018s2024 xx |||||o 00| ||eng c |
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|a 10.1021/acs.langmuir.4c02361
|2 doi
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|a pubmed25n1262.xml
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|e rakwb
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|a eng
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| 100 |
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|a Namba, Keita
|e verfasserin
|4 aut
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| 245 |
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|a Nanoscale Structures of Tough Microparticle-Based Films Investigated by Synchrotron X-Ray Scattering and All-Atom Molecular-Dynamics Simulation
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|c 2024
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|a Date Revised 02.11.2024
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a In this study, the nanoscale structures of microparticle-based films are revealed by synchrotron small-angle X-ray scattering (SAXS) and all-atom molecular-dynamics (AA-MD) simulations. The microparticle-based films consisting of the simplest acrylate polymer microparticles are applied as a model because the films are formed without additives and organic solvents and exhibit high toughness properties. The characteristic interfacial thickness (tinter) obtained from the SAXS analysis reflects the mixing degree of polymer chains on the microparticle surface in the film. The cross-linking density of inner microparticles is found to be strongly correlated to not only several properties of individual microparticles, such as swelling ratio and radius of gyration, but also the tinter and toughness of the corresponding films. Therefore, the tinter and toughness values follow a linear relationship because the cross-linking restricts the mixing of polymer chains between their surfaces in the film, which is a unique feature of microparticle-based films. This characteristic also affects their deformation behavior observed by in situ SAXS during tensile testing and their density profiles calculated by AA-MD simulations. This work provides a general strategy for material design to control the physical properties and structures of their films for advanced applications, including volatile organic compound-free sustainable coatings and adhesives
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|a Journal Article
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|a Sasaki, Yuma
|e verfasserin
|4 aut
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|a Kawamura, Yuto
|e verfasserin
|4 aut
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|a Yoshida, Shotaro
|e verfasserin
|4 aut
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| 700 |
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|a Hieda, Yoshiki
|e verfasserin
|4 aut
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| 700 |
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|a Fujimoto, Kazushi
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Watanabe, Natsuki
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Nishizawa, Yuichiro
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Uchihashi, Takayuki
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Suzuki, Daisuke
|e verfasserin
|4 aut
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| 700 |
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|a Kureha, Takuma
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1985
|g 40(2024), 43 vom: 29. Okt., Seite 22614-22626
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnas
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| 773 |
1 |
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|g volume:40
|g year:2024
|g number:43
|g day:29
|g month:10
|g pages:22614-22626
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|u http://dx.doi.org/10.1021/acs.langmuir.4c02361
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