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240630s2024 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202405906
|2 doi
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|a pubmed25n1246.xml
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|a (DE-627)NLM374313237
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|a (NLM)38943439
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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| 100 |
1 |
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|a Zheng, Ya Qi
|e verfasserin
|4 aut
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| 245 |
1 |
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|a Decoration of Ag Species into Reduced Graphene Oxide Foam as a Superelastic and Robust Host toward Stable Zn Metal Anodes under Dwell-Fatigue Condition
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|c 2024
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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| 338 |
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Revised 15.08.2024
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2024 The Author(s). Advanced Materials published by Wiley‐VCH GmbH.
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|a Deep-sea equipment usually operates under dwell-fatigue condition, which means the equipped energy storage devices must survive under the changing pressure. Special mechanical designs should be considered to maintain the electrochemical performance of electrodes under this extreme condition. In this work, an effective assembly strategy is proposed to accommodate the dwell-fatigue loading using Ag decorated reduced graphene oxide (rGO) foam (denoted as AGF) as a superelastic and robust Zn host. The wet-press assembly process enables the formation of highly porous and robust framework. The strong synergetic effect between rGO and Ag further guarantees AGF's superelasticity and ultrahigh mechanical strength. Meanwhile, the homogeneously distributed Ag species on the rGO sheets act as zincophilic sites to effectively facilitate Zn plating. Furthermore, AGF offers enough space to address the expansion during the charge and discharge cycles. As expected, the symmetrical cell using this AGFZn host demonstrates a long lifespan over 400 h at a depth-of-discharge of 50%. It is worth mentioning that the superelastic AGF host realizes stable Zn plating/stripping under varying pressures
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|a Journal Article
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|a Ag
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|a Zn metal anode
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4 |
|a dwell fatigue
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|a reduced graphene oxide
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| 650 |
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4 |
|a superelastic
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| 700 |
1 |
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|a Sun, Peng Xiao
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zhang, Xin Yu
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Li, Nian Wu
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Wu, Lili
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Luan, Deyan
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zhang, Xitian
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Lou, Xiong Wen David
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Yu, Le
|e verfasserin
|4 aut
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| 773 |
0 |
8 |
|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 36(2024), 33 vom: 01. Aug., Seite e2405906
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnas
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| 773 |
1 |
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|g volume:36
|g year:2024
|g number:33
|g day:01
|g month:08
|g pages:e2405906
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|u http://dx.doi.org/10.1002/adma.202405906
|3 Volltext
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|d 36
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|h e2405906
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