Characterization of silicon pore optics for the NewAthena X-ray observatory in the PTB laboratory at BESSY II

open access.

Bibliographische Detailangaben
Veröffentlicht in:Journal of synchrotron radiation. - 1994. - 31(2024), Pt 4 vom: 01. Juli, Seite 716-722
1. Verfasser: Krumrey, M (VerfasserIn)
Weitere Verfasser: Skroblin, D, Cibik, L, Collon, M, Vacanti, G, Barrière, N, Hauser, E, Bavdaz, M
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2024
Zugriff auf das übergeordnete Werk:Journal of synchrotron radiation
Schlagworte:Journal Article X-ray optics characterization X-ray reflectance optics characterization silicon pore optics
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520 |a The New Advanced Telescope for High ENergy Astrophysics (NewAthena) will be the largest space-based X-ray observatory ever built. It will have an effective area above 1.1 m2 at 1 keV, which corresponds to a polished mirror surface of about 300 m2 due to the grazing incidence. As such a mirror area is not achievable with an acceptable mass even with nested shells, silicon pore optics (SPO) technology will be utilized. In the PTB laboratory at BESSY II, two dedicated beamlines are in use for their characterization with monochromatic radiation at 1 keV and a low divergence well below 2 arcsec: the X-ray Pencil Beam Facility (XPBF 1) and the X-ray Parallel Beam Facility (XPBF 2.0), where beam sizes up to 8 mm × 8 mm are available while maintaining low beam divergence. This beamline is used for characterizing mirror stacks and controlling the focusing properties of mirror modules (MMs) - consisting of four mirror stacks - during their assembly at the beamline. A movable CCD based camera system 12 m from the MM registers the direct and the reflected beams. The positioning of the detector is verified by a laser tracker. The energy-dependent reflectance in double reflection through the pores of an MM with an Ir coating was measured at the PTB four-crystal monochromator beamline in the photon energy range 1.75 keV to 10 keV, revealing the effects of the Ir M edges. The measured reflectance properties are in agreement with the design values to achieve the envisaged effective area 
650 4 |a Journal Article 
650 4 |a X-ray optics characterization 
650 4 |a X-ray reflectance 
650 4 |a optics characterization 
650 4 |a silicon pore optics 
700 1 |a Skroblin, D  |e verfasserin  |4 aut 
700 1 |a Cibik, L  |e verfasserin  |4 aut 
700 1 |a Collon, M  |e verfasserin  |4 aut 
700 1 |a Vacanti, G  |e verfasserin  |4 aut 
700 1 |a Barrière, N  |e verfasserin  |4 aut 
700 1 |a Hauser, E  |e verfasserin  |4 aut 
700 1 |a Bavdaz, M  |e verfasserin  |4 aut 
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773 1 8 |g volume:31  |g year:2024  |g number:Pt 4  |g day:01  |g month:07  |g pages:716-722 
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