Multicolor Inks of Black Phosphorus for Midwave-Infrared Optoelectronics

© 2024 Wiley‐VCH GmbH.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 36(2024), 30 vom: 21. Juli, Seite e2402922
1. Verfasser: Kim, Jae Ik (VerfasserIn)
Weitere Verfasser: Higashitarumizu, Naoki, Wang, Shu, Yalisove, Reed, Scott, Mary C, Song, Seung Yong, Javey, Ali
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2024
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article black phosphorus gas sensing ink film multicolor infrared emission
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520 |a Black phosphorus (bP) based ink with a bulk bandgap of 0.33 eV (λ = 3.7 µm) has recently been shown to be promising for large-area, high performance mid-wave infrared (MWIR) optoelectronics. However, the development of multicolor bP inks expanding across the MWIR wavelength range has been challenging. Here a multicolor ink process based on bP with spectral emission tuned from 0.28 eV (λ = 4.4 µm) to 0.8 eV (λ = 1.5 µm) is demonstrated. Specifically, through the reduction of bP particle size distribution (i.e., lateral dimension and thickness), the optical bandgap systematically blueshifts, reaching up to 0.8 eV. Conversely, alloying bP with arsenic (bP1- xAsx) induces a redshift in the bandgap to 0.28 eV. The ink processed films are passivated with an infrared-transparent epoxy for stable infrared emission in ambient air. Utilizing these multicolor bP-based inks as an infrared light source, a gas sensing system is demonstrated that selectively detects gases, such as CO2 and CH4 whose absorption band varies around 4.3 and 3.3 µm, respectively. The presented ink formulation sets the stage for the advancement of multiplex MWIR optoelectronics, including spectrometers and spectral imaging using a low-cost material processing platform 
650 4 |a Journal Article 
650 4 |a black phosphorus 
650 4 |a gas sensing 
650 4 |a ink film 
650 4 |a multicolor infrared emission 
700 1 |a Higashitarumizu, Naoki  |e verfasserin  |4 aut 
700 1 |a Wang, Shu  |e verfasserin  |4 aut 
700 1 |a Yalisove, Reed  |e verfasserin  |4 aut 
700 1 |a Scott, Mary C  |e verfasserin  |4 aut 
700 1 |a Song, Seung Yong  |e verfasserin  |4 aut 
700 1 |a Javey, Ali  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 36(2024), 30 vom: 21. Juli, Seite e2402922  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:36  |g year:2024  |g number:30  |g day:21  |g month:07  |g pages:e2402922 
856 4 0 |u http://dx.doi.org/10.1002/adma.202402922  |3 Volltext 
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