Approaching the Ideal Linearity in Epitaxial Crystalline-Type Memristor by Controlling Filament Growth

© 2024 The Authors. Advanced Materials published by Wiley‐VCH GmbH.

Détails bibliographiques
Publié dans:Advanced materials (Deerfield Beach, Fla.). - 1998. - 36(2024), 29 vom: 01. Juli, Seite e2401021
Auteur principal: Zeng, Tao (Auteur)
Autres auteurs: Shi, Shu, Hu, Kejun, Jia, Lanxin, Li, Boyu, Sun, Kaixuan, Su, Hanxin, Gu, Youdi, Xu, Xiaohong, Song, Dongsheng, Yan, Xiaobing, Chen, Jingsheng
Format: Article en ligne
Langue:English
Publié: 2024
Accès à la collection:Advanced materials (Deerfield Beach, Fla.)
Sujets:Journal Article controlled filament growth crystalline‐type memristor epitaxial Hf0.5Zr0.5O2 film grain boundary diffusion ideal linearity