Large-Area Preparation of a Robust Superamphiphobic Coating for Chemical Mechanical Polishing Application
In the chemical-mechanical polishing (CMP) process, the abrasive particles in the polishing slurry tend to agglomerate easily and crystallize on the equipment surfaces during recycling, which can lead to poor wafer processing quality and additional tedious cleaning work. To overcome this issue, a si...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 40(2024), 14 vom: 09. Apr., Seite 7502-7511
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| 1. Verfasser: |
Xue, Fang
(VerfasserIn) |
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| Weitere Verfasser: |
Kou, Minghu,
Zhou, Huiyan,
Meng, Weitao,
Tian, Yu,
Jiang, Jile |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2024
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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