Topologically Protected Quantum Logic Gates with Valley-Hall Photonic Crystals

© 2024 Wiley‐VCH GmbH.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 36(2024), 24 vom: 13. Juni, Seite e2311611
1. Verfasser: He, Lu (VerfasserIn)
Weitere Verfasser: Liu, Dongning, Zhang, Huizhen, Zhang, Furong, Zhang, Weixuan, Feng, Xue, Huang, Yidong, Cui, Kaiyu, Liu, Fang, Zhang, Wei, Zhang, Xiangdong
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2024
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article quantum circuit quantum gate topological protection valley photonic crystals
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520 |a Topological photonics provide a promising way to realize more robust optical devices against some defects and environmental perturbations. Quantum logic gates are fundamental units of quantum computers, which are widely used in future quantum information processing. Thus, constructing robust universal quantum logic gates is an important way forward to practical quantum computing. However, the most important problem to be solved is how to construct the quantum-logic-gate-required 2 × 2 beam splitter with topological protection. Here, the experimental realization of the topologically protected contradirectional coupler is reported, which can be employed to realize the quantum logic gates, including control-NOT and Hadamard gates, on the silicon photonic platform. These quantum gates not only have high experimental fidelities but also exhibit a certain degree of tolerances against certain types of defects. This work paves the way for the development of practical optical quantum computations and signal processing 
650 4 |a Journal Article 
650 4 |a quantum circuit 
650 4 |a quantum gate 
650 4 |a topological protection 
650 4 |a valley photonic crystals 
700 1 |a Liu, Dongning  |e verfasserin  |4 aut 
700 1 |a Zhang, Huizhen  |e verfasserin  |4 aut 
700 1 |a Zhang, Furong  |e verfasserin  |4 aut 
700 1 |a Zhang, Weixuan  |e verfasserin  |4 aut 
700 1 |a Feng, Xue  |e verfasserin  |4 aut 
700 1 |a Huang, Yidong  |e verfasserin  |4 aut 
700 1 |a Cui, Kaiyu  |e verfasserin  |4 aut 
700 1 |a Liu, Fang  |e verfasserin  |4 aut 
700 1 |a Zhang, Wei  |e verfasserin  |4 aut 
700 1 |a Zhang, Xiangdong  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 36(2024), 24 vom: 13. Juni, Seite e2311611  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:36  |g year:2024  |g number:24  |g day:13  |g month:06  |g pages:e2311611 
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