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|a 10.1002/adma.202311157
|2 doi
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|a pubmed24n1432.xml
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|a (DE-627)NLM368923983
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|a (NLM)38402421
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Butcher, Tim A
|e verfasserin
|4 aut
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|a Ptychographic Nanoscale Imaging of the Magnetoelectric Coupling in Freestanding BiFeO3
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|c 2024
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Revised 07.06.2024
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2024 The Authors. Advanced Materials published by Wiley‐VCH GmbH.
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|a Understanding the magnetic and ferroelectric ordering of magnetoelectric multiferroic materials at the nanoscale necessitates a versatile imaging method with high spatial resolution. Here, soft X-ray ptychography is employed to simultaneously image the ferroelectric and antiferromagnetic domains in an 80 nm thin freestanding film of the room-temperature multiferroic BiFeO3 (BFO). The antiferromagnetic spin cycloid of period 64 nm is resolved by reconstructing the corresponding resonant elastic X-ray scattering in real space and visualized together with mosaic-like ferroelectric domains in a linear dichroic contrast image at the Fe L3 edge. The measurements reveal a near perfect coupling between the antiferromagnetic and ferroelectric ordering by which the propagation direction of the spin cycloid is locked orthogonally to the ferroelectric polarization. In addition, the study evinces both a preference for in-plane propagation of the spin cycloid and changes of the ferroelectric polarization by 71° between multiferroic domains in the epitaxial strain-free, freestanding BFO film. The results provide a direct visualization of the strong magnetoelectric coupling in BFO and of its fine multiferroic domain structure, emphasizing the potential of ptychographic imaging for the study of multiferroics and non-collinear magnetic materials with soft X-rays
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|a Journal Article
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|a X‐ray microscopy
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|a bismuth ferrite
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|a freestanding films
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|a multiferroic domains
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|a soft X‐ray ptychography
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|a synchrotron techniques
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|a Phillips, Nicholas W
|e verfasserin
|4 aut
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|a Chiu, Chun-Chien
|e verfasserin
|4 aut
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|a Wei, Chia-Chun
|e verfasserin
|4 aut
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|a Ho, Sheng-Zhu
|e verfasserin
|4 aut
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|a Chen, Yi-Chun
|e verfasserin
|4 aut
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|a Fröjdh, Erik
|e verfasserin
|4 aut
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|a Baruffaldi, Filippo
|e verfasserin
|4 aut
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|a Carulla, Maria
|e verfasserin
|4 aut
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|a Zhang, Jiaguo
|e verfasserin
|4 aut
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|a Bergamaschi, Anna
|e verfasserin
|4 aut
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|a Vaz, Carlos A F
|e verfasserin
|4 aut
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|a Kleibert, Armin
|e verfasserin
|4 aut
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|a Finizio, Simone
|e verfasserin
|4 aut
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|a Yang, Jan-Chi
|e verfasserin
|4 aut
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|a Huang, Shih-Wen
|e verfasserin
|4 aut
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|a Raabe, Jörg
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 36(2024), 23 vom: 24. Juni, Seite e2311157
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:36
|g year:2024
|g number:23
|g day:24
|g month:06
|g pages:e2311157
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|u http://dx.doi.org/10.1002/adma.202311157
|3 Volltext
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|d 36
|j 2024
|e 23
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