Tunable Adhesion for All-Dry Transfer of 2D Materials Enabled by the Freezing of Transfer Medium

© 2024 Wiley‐VCH GmbH.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 36(2024), 15 vom: 12. Apr., Seite e2308950
1. Verfasser: Chen, Sensheng (VerfasserIn)
Weitere Verfasser: Chen, Ge, Zhao, Yixuan, Bu, Saiyu, Hu, Zhaoning, Mao, Boyang, Wu, Haotian, Liao, Junhao, Li, Fangfang, Zhou, Chaofan, Guo, Bingbing, Liu, Wenlin, Zhu, Yaqi, Lu, Qi, Hu, Jingyi, Shang, Mingpeng, Shi, Zhuofeng, Yu, Beiming, Zhang, Xiaodong, Zhao, Zhenxin, Jia, Kaicheng, Zhang, Yanfeng, Sun, Pengzhan, Liu, Zhongfan, Lin, Li, Wang, Xiaomin
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2024
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article CVD graphene films dry transfer graphene transfer graphene wafers ultraclean surface
LEADER 01000caa a22002652 4500
001 NLM367789981
003 DE-627
005 20240412232747.0
007 cr uuu---uuuuu
008 240130s2024 xx |||||o 00| ||eng c
024 7 |a 10.1002/adma.202308950  |2 doi 
028 5 2 |a pubmed24n1373.xml 
035 |a (DE-627)NLM367789981 
035 |a (NLM)38288661 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Chen, Sensheng  |e verfasserin  |4 aut 
245 1 0 |a Tunable Adhesion for All-Dry Transfer of 2D Materials Enabled by the Freezing of Transfer Medium 
264 1 |c 2024 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Revised 11.04.2024 
500 |a published: Print-Electronic 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a © 2024 Wiley‐VCH GmbH. 
520 |a The real applications of chemical vapor deposition (CVD)-grown graphene films require the reliable techniques for transferring graphene from growth substrates onto application-specific substrates. The transfer approaches that avoid the use of organic solvents, etchants, and strong bases are compatible with industrial batch processing, in which graphene transfer should be conducted by dry exfoliation and lamination. However, all-dry transfer of graphene remains unachievable owing to the difficulty in precisely controlling interfacial adhesion to enable the crack- and contamination-free transfer. Herein, through controllable crosslinking of transfer medium polymer, the adhesion is successfully tuned between the polymer and graphene for all-dry transfer of graphene wafers. Stronger adhesion enables crack-free peeling of the graphene from growth substrates, while reduced adhesion facilitates the exfoliation of polymer from graphene surface leaving an ultraclean surface. This work provides an industrially compatible approach for transferring 2D materials, key for their future applications, and offers a route for tuning the interfacial adhesion that would allow for the transfer-enabled fabrication of van der Waals heterostructures 
650 4 |a Journal Article 
650 4 |a CVD graphene films 
650 4 |a dry transfer 
650 4 |a graphene transfer 
650 4 |a graphene wafers 
650 4 |a ultraclean surface 
700 1 |a Chen, Ge  |e verfasserin  |4 aut 
700 1 |a Zhao, Yixuan  |e verfasserin  |4 aut 
700 1 |a Bu, Saiyu  |e verfasserin  |4 aut 
700 1 |a Hu, Zhaoning  |e verfasserin  |4 aut 
700 1 |a Mao, Boyang  |e verfasserin  |4 aut 
700 1 |a Wu, Haotian  |e verfasserin  |4 aut 
700 1 |a Liao, Junhao  |e verfasserin  |4 aut 
700 1 |a Li, Fangfang  |e verfasserin  |4 aut 
700 1 |a Zhou, Chaofan  |e verfasserin  |4 aut 
700 1 |a Guo, Bingbing  |e verfasserin  |4 aut 
700 1 |a Liu, Wenlin  |e verfasserin  |4 aut 
700 1 |a Zhu, Yaqi  |e verfasserin  |4 aut 
700 1 |a Lu, Qi  |e verfasserin  |4 aut 
700 1 |a Hu, Jingyi  |e verfasserin  |4 aut 
700 1 |a Shang, Mingpeng  |e verfasserin  |4 aut 
700 1 |a Shi, Zhuofeng  |e verfasserin  |4 aut 
700 1 |a Yu, Beiming  |e verfasserin  |4 aut 
700 1 |a Zhang, Xiaodong  |e verfasserin  |4 aut 
700 1 |a Zhao, Zhenxin  |e verfasserin  |4 aut 
700 1 |a Jia, Kaicheng  |e verfasserin  |4 aut 
700 1 |a Zhang, Yanfeng  |e verfasserin  |4 aut 
700 1 |a Sun, Pengzhan  |e verfasserin  |4 aut 
700 1 |a Liu, Zhongfan  |e verfasserin  |4 aut 
700 1 |a Lin, Li  |e verfasserin  |4 aut 
700 1 |a Wang, Xiaomin  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 36(2024), 15 vom: 12. Apr., Seite e2308950  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:36  |g year:2024  |g number:15  |g day:12  |g month:04  |g pages:e2308950 
856 4 0 |u http://dx.doi.org/10.1002/adma.202308950  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_350 
951 |a AR 
952 |d 36  |j 2024  |e 15  |b 12  |c 04  |h e2308950