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240125s2024 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202308415
|2 doi
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|a eng
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|a Yu, Jihao
|e verfasserin
|4 aut
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|a Observation of Topological Hall Effect in a Chemically Complex Alloy
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|c 2024
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|a ƒa Online-Ressource
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|a Date Revised 11.04.2024
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2024 Wiley‐VCH GmbH.
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|a The topological Hall effect (THE) is the transport response of chiral spin textures and thus can serve as a powerful probe for detecting and understanding these unconventional magnetic orders. So far, the THE is only observed in either noncentrosymmetric systems where spin chirality is stabilized by Dzyaloshinskii-Moriya interactions, or triangular-lattice magnets with Ruderman-Kittel-Kasuya-Yosida-type interactions. Here, a pronounced THE is observed in a Fe-Co-Ni-Mn chemically complex alloy with a simple face-centered cubic (fcc) structure across a wide range of temperatures and magnetic fields. The alloy is shown to have a strong magnetic frustration owing to the random occupation of magnetic atoms on the close-packed fcc lattice and the direct Heisenberg exchange interaction among atoms, as evidenced by the appearance of a reentrant spin glass state in the low-temperature regime and the first principles calculations. Consequently, THE is attributed to the nonvanishing spin chirality created by strong spin frustration under the external magnetic field, which is distinct from the mechanism responsible for the skyrmion systems, as well as geometrically frustrated magnets
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|a Journal Article
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|a chemical disorder
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|a chemically complex alloys
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|a magnetic frustration
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|a spin chirality
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|a topological Hall effect
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|a Liu, Yuying
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Ke, Yubin
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Su, Jiaqi
|e verfasserin
|4 aut
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1 |
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|a Cao, Jingshan
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Li, Zian
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Sun, Baoan
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Bai, Haiyang
|e verfasserin
|4 aut
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| 700 |
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|a Wang, Weihua
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 36(2024), 15 vom: 08. Apr., Seite e2308415
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnas
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| 773 |
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|g volume:36
|g year:2024
|g number:15
|g day:08
|g month:04
|g pages:e2308415
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|u http://dx.doi.org/10.1002/adma.202308415
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