Spin-Selective Memtransistors with Magnetized Graphene

© 2024 Wiley‐VCH GmbH.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 36(2024), 15 vom: 18. Apr., Seite e2310291
1. Verfasser: Jeong, Juyeong (VerfasserIn)
Weitere Verfasser: Kiem, Do Hoon, Guo, Dan, Duan, Ruihuan, Watanabe, Kenji, Taniguchi, Takashi, Liu, Zheng, Han, Myung Joon, Zheng, Shoujun, Yang, Heejun
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2024
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article CrI3 magnetized graphene memtransistor
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520 |a Spin-polarized bands in pristine and proximity-induced magnetic materials are promising building blocks for future devices. Conceptually new memory, logic, and neuromorphic devices are conceived based on atomically thin magnetic materials and the manipulation of their spin-polarized bands via electrical and optical methods. A critical remaining issue is the direct probe and the optimized use of the magnetic coupling effect in van der Waals heterostructures, which requires further delicate design of atomically thin magnetic materials and devices. Here, a spin-selective memtransistor with magnetized single-layered graphene on a reactive antiferromagnetic material, CrI3, is reported. The spin-dependent hybridization between graphene and CrI3 atomic layers enables the spin-selective bandgap opening in the single-layered graphene and the electric field control of magnetization in a specific CrI3 layer. The microscopic working principle is clarified by the first-principles calculations and theoretical analysis of the transport data. Reliable memtransistor operations (i.e., memory and logic device-combined operations), as well as a spin-selective probe of Landau levels in the magnetized graphene, are achieved by using the subtle manipulation of the magnetic proximity effect via electrical means 
650 4 |a Journal Article 
650 4 |a CrI3 
650 4 |a magnetized graphene 
650 4 |a memtransistor 
700 1 |a Kiem, Do Hoon  |e verfasserin  |4 aut 
700 1 |a Guo, Dan  |e verfasserin  |4 aut 
700 1 |a Duan, Ruihuan  |e verfasserin  |4 aut 
700 1 |a Watanabe, Kenji  |e verfasserin  |4 aut 
700 1 |a Taniguchi, Takashi  |e verfasserin  |4 aut 
700 1 |a Liu, Zheng  |e verfasserin  |4 aut 
700 1 |a Han, Myung Joon  |e verfasserin  |4 aut 
700 1 |a Zheng, Shoujun  |e verfasserin  |4 aut 
700 1 |a Yang, Heejun  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 36(2024), 15 vom: 18. Apr., Seite e2310291  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:36  |g year:2024  |g number:15  |g day:18  |g month:04  |g pages:e2310291 
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