Style de citation APA

Li, X., Chen, N., Wang, B., Niu, M., Xu, M., Miao, X., & Li, X. (2024). Resistive Memory Devices at the Thinnest Limit: Progress and Challenges. Advanced materials (Deerfield Beach, Fla.), 36(15), . https://doi.org/10.1002/adma.202307951

Style de citation Chicago

Li, Xiao-Dong, Nian-Ke Chen, Bai-Qian Wang, Meng Niu, Ming Xu, Xiangshui Miao, et Xian-Bin Li. "Resistive Memory Devices at the Thinnest Limit: Progress and Challenges." Advanced Materials (Deerfield Beach, Fla.) 36, no. 15 (2024). https://dx.doi.org/10.1002/adma.202307951.

Style de citation MLA

Li, Xiao-Dong, et al. "Resistive Memory Devices at the Thinnest Limit: Progress and Challenges." Advanced Materials (Deerfield Beach, Fla.), vol. 36, no. 15, 2024.