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231226s2023 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202301563
|2 doi
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|a pubmed24n1290.xml
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|a (DE-627)NLM360480063
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|a (NLM)37548335
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|a DE-627
|b ger
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|e rakwb
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|a eng
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| 100 |
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|a Zhou, Qi
|e verfasserin
|4 aut
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| 245 |
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|a Spatially Controlled UV Light Generation at Depth using Upconversion Micelles
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|c 2023
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Revised 12.02.2024
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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| 520 |
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|a © 2023 Wiley-VCH GmbH.
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|a UV light can trigger a plethora of useful photochemical reactions for diverse applications, including photocatalysis, photopolymerization, and drug delivery. These applications typically require penetration of high-energy photons deep into materials, yet delivering these photons beyond the surface is extremely challenging due to absorption and scattering effects. Triplet-triplet annihilation upconversion (TTA-UC) shows great promise to circumvent this issue by generating high-energy photons from incident lower-energy photons. However, molecules that facilitate TTA-UC usually have poor water solubility, limiting their deployment in aqueous environments. To address this challenge, a nanoencapsulation method is leveraged to fabricate water-compatible UC micelles, enabling on-demand UV photon generation deep into materials. Two iridium-based complexes are presented for use as TTA-UC sensitizers with increased solubilities that facilitate the formation of highly emissive UV-upconverting micelles. Furthermore, this encapsulation method is shown to be generalizable to nineteen UV-emitting UC systems, accessing a range of upconverted UV emission profiles with wavelengths as low as 350 nm. As a proof-of-principle demonstration of precision photochemistry at depth, UV-emitting UC micelles are used to photolyze a fluorophore at a focal point nearly a centimeter beyond the surface, revealing opportunities for spatially controlled manipulation deep into UV-responsive materials
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|a Journal Article
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4 |
|a UV light
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4 |
|a micelles
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4 |
|a penetration depth
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| 650 |
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4 |
|a photolysis
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4 |
|a spatial control
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| 650 |
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4 |
|a upconversion
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1 |
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|a Wirtz, Brendan M
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Schloemer, Tracy H
|e verfasserin
|4 aut
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1 |
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|a Burroughs, Michael C
|e verfasserin
|4 aut
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1 |
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|a Hu, Manchen
|e verfasserin
|4 aut
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|a Narayanan, Pournima
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Lyu, Junrui
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Gallegos, Arynn O
|e verfasserin
|4 aut
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| 700 |
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|a Layton, Colette
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Mai, Danielle J
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Congreve, Daniel N
|e verfasserin
|4 aut
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| 773 |
0 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 35(2023), 46 vom: 01. Nov., Seite e2301563
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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| 773 |
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|g volume:35
|g year:2023
|g number:46
|g day:01
|g month:11
|g pages:e2301563
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|u http://dx.doi.org/10.1002/adma.202301563
|3 Volltext
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