Single-Nanoparticle-Based Nanomachining for Fabrication of a Uniform Nanochannel Sensor

© 2023 Wiley-VCH GmbH.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - (2023) vom: 24. Juli, Seite e2305159
1. Verfasser: Miao, Longfei (VerfasserIn)
Weitere Verfasser: Huang, Bintong, Fang, Hui, Chai, Jia, Liu, Ze, Zhai, Yueming
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2023
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article metal-assisted etching nanochannels nanomachining nanopores single nanoparticles
LEADER 01000caa a22002652 4500
001 NLM35987018X
003 DE-627
005 20231227135236.0
007 cr uuu---uuuuu
008 231226s2023 xx |||||o 00| ||eng c
024 7 |a 10.1002/adma.202305159  |2 doi 
028 5 2 |a pubmed24n1234.xml 
035 |a (DE-627)NLM35987018X 
035 |a (NLM)37486796 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Miao, Longfei  |e verfasserin  |4 aut 
245 1 0 |a Single-Nanoparticle-Based Nanomachining for Fabrication of a Uniform Nanochannel Sensor 
264 1 |c 2023 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Revised 20.12.2023 
500 |a published: Print-Electronic 
500 |a Citation Status Publisher 
520 |a © 2023 Wiley-VCH GmbH. 
520 |a The structure of nanomaterials and nanodevices determines their functionality and applications. A single uniform nanochannel with a high aspect ratio is an attractive structure due to its unique rigid structures, easy preparation, and diverse pore structures and it holds significant promising importance in fields such as nanopore sensing and nanomanufacturing. Although the metal-nanoparticle-assistant silicon etching technique can produce uniform nanochannels, however, the fabrication of single through nanochannels remains a challenge thus far. A simple and versatile strategy is developed that allows for the retention of individual gold nanoparticle on a substrate, enabling single-nanoparticle nanomachining. This method involves three steps: the formation of a carbon protective layer on individual nanoparticles via electron-beam irradiation, selective removal of unprotected nanoparticles using a corrosive agent, and subsequent elimination of the carbon layer. This enables the fabrication of a single submillimeter-long uniform through nanochannel in the silicon wafer, which can be employed for nanopore sensing and shape-based nanoparticle distinguishing. The developed method can also facilitate single-nanoparticle studies and nanomachining for a broad application in materials science, electronics, micro/nano-optics, and catalysis 
650 4 |a Journal Article 
650 4 |a metal-assisted etching 
650 4 |a nanochannels 
650 4 |a nanomachining 
650 4 |a nanopores 
650 4 |a single nanoparticles 
700 1 |a Huang, Bintong  |e verfasserin  |4 aut 
700 1 |a Fang, Hui  |e verfasserin  |4 aut 
700 1 |a Chai, Jia  |e verfasserin  |4 aut 
700 1 |a Liu, Ze  |e verfasserin  |4 aut 
700 1 |a Zhai, Yueming  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g (2023) vom: 24. Juli, Seite e2305159  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g year:2023  |g day:24  |g month:07  |g pages:e2305159 
856 4 0 |u http://dx.doi.org/10.1002/adma.202305159  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_350 
951 |a AR 
952 |j 2023  |b 24  |c 07  |h e2305159