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|a 10.1002/adma.202302045
|2 doi
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|a pubmed24n1198.xml
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|a (DE-627)NLM359425313
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|a (NLM)37441751
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Calandrini, Eugenio
|e verfasserin
|4 aut
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|a Near- and Far-Field Observation of Phonon Polaritons in Wafer-Scale Multilayer Hexagonal Boron Nitride Prepared by Chemical Vapor Deposition
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|c 2023
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Revised 02.11.2023
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2023 Wiley-VCH GmbH.
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|a Polaritons in layered materials (LMs) are a promising platform to manipulate and control light at the nanometer scale. Thus, the observation of polaritons in wafer-scale LMs is critically important for the development of industrially relevant nanophotonics and optoelectronics applications. In this work, phonon polaritons (PhPs) in wafer-scale multilayer hexagonal boron nitride (hBN) grown by chemical vapor deposition are reported. By infrared nanoimaging, the PhPs are visualized, and PhP lifetimes of ≈0.6 ps are measured, comparable to that of micromechanically exfoliated multilayer hBN. Further, PhP nanoresonators are demonstrated. Their quality factors of ≈50 are about 0.7 times that of state-of-the-art devices based on exfoliated hBN. These results can enable PhP-based surface-enhanced infrared spectroscopy (e.g., for gas sensing) and infrared photodetector applications
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|a Journal Article
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|a chemical vapor deposition
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|a hexagonal boron nitride
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|a phonon polaritons
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|a wafer-scale
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|a Voronin, Kirill
|e verfasserin
|4 aut
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|a Balci, Osman
|e verfasserin
|4 aut
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|a Barra-Burillo, Maria
|e verfasserin
|4 aut
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|a Bylinkin, Andrei
|e verfasserin
|4 aut
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|a Shinde, Sachin M
|e verfasserin
|4 aut
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|a Sharma, Subash
|e verfasserin
|4 aut
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|a Casanova, Fèlix
|e verfasserin
|4 aut
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|a Hueso, Luis E
|e verfasserin
|4 aut
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|a Chuvilin, Andrei
|e verfasserin
|4 aut
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|a McAleese, Clifford
|e verfasserin
|4 aut
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|a Conran, Ben R
|e verfasserin
|4 aut
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|a Wang, Xiaochen
|e verfasserin
|4 aut
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|a Teo, Kenneth
|e verfasserin
|4 aut
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|a Volkov, Valentyn S
|e verfasserin
|4 aut
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|a Ferrari, Andrea C
|e verfasserin
|4 aut
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|a Nikitin, Alexey Y
|e verfasserin
|4 aut
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|a Hillenbrand, Rainer
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 35(2023), 44 vom: 25. Nov., Seite e2302045
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:35
|g year:2023
|g number:44
|g day:25
|g month:11
|g pages:e2302045
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|u http://dx.doi.org/10.1002/adma.202302045
|3 Volltext
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|d 35
|j 2023
|e 44
|b 25
|c 11
|h e2302045
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