Colloidal Deposition by Polymer-Surfactant Complexes with Dilution and Shear
Deposition of silica microparticles on glass substrates was measured as a function of cationic polymer-anionic surfactant composition and shear rate. Particles were initially deposited in quiescent conditions in different polymer-surfactant compositions, which were chosen based on prior measurements...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 39(2023), 25 vom: 27. Juni, Seite 8680-8689 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2023
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |
| Zusammenfassung: | Deposition of silica microparticles on glass substrates was measured as a function of cationic polymer-anionic surfactant composition and shear rate. Particles were initially deposited in quiescent conditions in different polymer-surfactant compositions, which were chosen based on prior measurements of composition-dependent polymer-surfactant interactions and deposition behavior (up to 0.5 wt % polymer and 12 wt % surfactant). Programmed shear and dilution profiles in a flow cell together with optical microscopy observation were used to continuously track particle deposition, detachment, and redeposition. Knowledge of the shear-dependent torque on each particle provides information on adhesive torque mediated by polymer-surfactant complexes. Detachment of colloids initially deposited by depletion interactions occurs at low shear rates (∼100 s-1) due to lack of tangential forces or an adhesive torque. Further dilution produced redeposition of particles that resisted detachment (up to ∼2000 s-1) as the result of strong cationic polymer bridge formation, presumably due to preferential surfactant removal. Dilution from different initial compositions indicates a pathway dependence of polymer-surfactant de-complexation into shear-resistant cationic bridges. These findings demonstrate the ability to program deposition behavior via the informed design of initial polymer-surfactant compositions and shear profiles. The particle trajectory analysis developed in this work provides an assay to screen composition-dependent colloidal deposition in diverse materials and applications |
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| Beschreibung: | Date Completed 27.06.2023 Date Revised 27.06.2023 published: Print-Electronic Citation Status PubMed-not-MEDLINE |
| ISSN: | 1520-5827 |
| DOI: | 10.1021/acs.langmuir.3c00588 |