Noninvasive Photodelamination of van der Waals Semiconductors for High-Performance Electronics
© 2023 Wiley-VCH GmbH.
| Veröffentlicht in: | Advanced materials (Deerfield Beach, Fla.). - 1998. - 35(2023), 25 vom: 05. Juni, Seite e2300618 |
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| 1. Verfasser: | |
| Weitere Verfasser: | , , , , , |
| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2023
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| Zugriff auf das übergeordnete Werk: | Advanced materials (Deerfield Beach, Fla.) |
| Schlagworte: | Journal Article 2D materials atomic-layer etching charge transport energy funneling lattice vacancies oxidation van der Waals semiconductors |
| Zusammenfassung: | © 2023 Wiley-VCH GmbH. Atomically thin 2D van der Waals semiconductors are promising candidate materials for post-silicon electronics. However, it remains challenging to attain completely uniform monolayer semiconductor wafers free of over-grown islands. Here, the observation of the energy-funneling effect and ambient photodelamination phenomenon in inhomogeneous few-layer WS2 flakes under low-illumination fluencies down to several nW µm-2 and its potential as a noninvasive atomic-layer etching strategy for selectively stripping the local excessive overlying islands are reported. Photoluminescent tracking on the photoetching traces reveals relatively fast etching rates of around 0.3-0.8 µm min-1 at varied temperatures and an activation energy of 1.7 eV. By using crystallographic and electronic characterization, the noninvasive nature of the low-power photodelamination and the highly preserved lattice quality are also confirmed in the as-etched monolayer products, featuring a comparable density of atomic defects (≈4.2 × 1013 cm-2 ) to pristine flakes and a high electron mobility of up to 80 cm2 V-1 s-1 at room temperature. This approach opens a noninvasive postetching route for thickness uniformity management in 2D van der Waals semiconductor wafers for electronic applications |
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| Beschreibung: | Date Completed 22.06.2023 Date Revised 22.06.2023 published: Print-Electronic Citation Status PubMed-not-MEDLINE |
| ISSN: | 1521-4095 |
| DOI: | 10.1002/adma.202300618 |