Light-Induced Bipolar Photoresponse with Amplified Photocurrents in an Electrolyte-Assisted Bipolar p-n Junction

© 2023 Wiley-VCH GmbH.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 35(2023), 28 vom: 08. Juli, Seite e2300911
1. Verfasser: Fang, Shi (VerfasserIn)
Weitere Verfasser: Li, Liuan, Wang, Weiyi, Chen, Wei, Wang, Danhao, Kang, Yang, Liu, Xin, Jia, Hongfeng, Luo, Yuanmin, Yu, Huabin, Memon, Muhammad Hunain, Hu, Wei, Ooi, Boon S, He, Jr-Hau, Sun, Haiding
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2023
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article bipolar junctions bipolar photoresponse dual-channel optical communication gallium nitride nanowires surface decoration Electrolytes gallium nitride 1R9CC3P9VL Oxides Ruthenium Compounds
LEADER 01000naa a22002652 4500
001 NLM35418315X
003 DE-627
005 20231226061653.0
007 cr uuu---uuuuu
008 231226s2023 xx |||||o 00| ||eng c
024 7 |a 10.1002/adma.202300911  |2 doi 
028 5 2 |a pubmed24n1180.xml 
035 |a (DE-627)NLM35418315X 
035 |a (NLM)36912711 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Fang, Shi  |e verfasserin  |4 aut 
245 1 0 |a Light-Induced Bipolar Photoresponse with Amplified Photocurrents in an Electrolyte-Assisted Bipolar p-n Junction 
264 1 |c 2023 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Completed 25.07.2023 
500 |a Date Revised 25.07.2023 
500 |a published: Print-Electronic 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a © 2023 Wiley-VCH GmbH. 
520 |a The p-n junction with bipolar characteristics sets the fundamental unit to build electronics while its unique rectification behavior constrains the degree of carrier tunability for expanded functionalities. Herein, a bipolar-junction photoelectrode employed with a gallium nitride (GaN) p-n homojunction nanowire array that operates in electrolyte is reported, demonstrating bipolar photoresponse controlled by different wavelengths of light. Significantly, with rational decoration of a ruthenium oxides (RuOx ) layer on nanowires guided by theoretical modeling, the resulting RuOx /p-n GaN photoelectrode exhibits unambiguously boosted bipolar photoresponse by an enhancement of 775% and 3000% for positive and negative photocurrents, respectively, compared to the pristine nanowires. The loading of the RuOx layer on nanowire surface optimizes surface band bending, which facilitates charge transfer across the GaN/electrolyte interface, meanwhile promoting the efficiency of redox reaction for both hydrogen evolution reaction and oxygen evolution reaction which corresponds to the negative and positive photocurrents, respectively. Finally, a dual-channel optical communication system incorporated with such photoelectrode is constructed with using only one photoelectrode to decode dual-band signals with encrypted property. The proposed bipolar device architecture presents a viable route to manipulate the carrier dynamics for the development of a plethora of multifunctional optoelectronic devices for future sensing, communication, and imaging systems 
650 4 |a Journal Article 
650 4 |a bipolar junctions 
650 4 |a bipolar photoresponse 
650 4 |a dual-channel optical communication 
650 4 |a gallium nitride nanowires 
650 4 |a surface decoration 
650 7 |a Electrolytes  |2 NLM 
650 7 |a gallium nitride  |2 NLM 
650 7 |a 1R9CC3P9VL  |2 NLM 
650 7 |a Oxides  |2 NLM 
650 7 |a Ruthenium Compounds  |2 NLM 
700 1 |a Li, Liuan  |e verfasserin  |4 aut 
700 1 |a Wang, Weiyi  |e verfasserin  |4 aut 
700 1 |a Chen, Wei  |e verfasserin  |4 aut 
700 1 |a Wang, Danhao  |e verfasserin  |4 aut 
700 1 |a Kang, Yang  |e verfasserin  |4 aut 
700 1 |a Liu, Xin  |e verfasserin  |4 aut 
700 1 |a Jia, Hongfeng  |e verfasserin  |4 aut 
700 1 |a Luo, Yuanmin  |e verfasserin  |4 aut 
700 1 |a Yu, Huabin  |e verfasserin  |4 aut 
700 1 |a Memon, Muhammad Hunain  |e verfasserin  |4 aut 
700 1 |a Hu, Wei  |e verfasserin  |4 aut 
700 1 |a Ooi, Boon S  |e verfasserin  |4 aut 
700 1 |a He, Jr-Hau  |e verfasserin  |4 aut 
700 1 |a Sun, Haiding  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 35(2023), 28 vom: 08. Juli, Seite e2300911  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:35  |g year:2023  |g number:28  |g day:08  |g month:07  |g pages:e2300911 
856 4 0 |u http://dx.doi.org/10.1002/adma.202300911  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_350 
951 |a AR 
952 |d 35  |j 2023  |e 28  |b 08  |c 07  |h e2300911