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231226s2023 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202211487
|2 doi
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|a pubmed24n1179.xml
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|a (DE-627)NLM353998702
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|a (NLM)36894169
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Dong, Jiufeng
|e verfasserin
|4 aut
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|a Scalable Polyimide-Organosilicate Hybrid Films for High-Temperature Capacitive Energy Storage
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|c 2023
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Completed 18.05.2023
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|a Date Revised 18.05.2023
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2023 Wiley-VCH GmbH.
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|a High-temperature polymer dielectrics have broad application prospects in next-generation microelectronics and electrical power systems. However, the capacitive energy densities of dielectric polymers at elevated temperatures are severely limited by carrier excitation and transport. Herein, a molecular engineering strategy is presented to regulate the bulk-limited conduction in the polymer by bonding amino polyhedral oligomeric silsesquioxane (NH2 -POSS) with the chain ends of polyimide (PI). Experimental studies and density functional theory (DFT) calculations demonstrate that the terminal group NH2 -POSS with a wide-bandgap of Eg ≈ 6.6 eV increases the band energy levels of the PI and induces the formation of local deep traps in the hybrid films, which significantly restrains carrier transport. At 200 °C, the hybrid film exhibits concurrently an ultrahigh discharged energy density of 3.45 J cm-3 and a high gravimetric energy density of 2.74 J g-1 , with the charge-discharge efficiency >90%, far exceeding those achieved in the dielectric polymers and nearly all other polymer nanocomposites. Moreover, the NH2 -POSS terminated PI film exhibits excellent charge-discharge cyclability (>50000) and power density (0.39 MW cm-3 ) at 200 °C, making it a promising candidate for high-temperature high-energy-density capacitors. This work represents a novel strategy to scalable polymer dielectrics with superior capacitive performance operating in harsh environments
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|a Journal Article
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|a capacitors
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|a elevated temperature
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|a energy storage
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|a hybrid films
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|a molecular engineering
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|a Li, Li
|e verfasserin
|4 aut
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|a Qiu, Peiqi
|e verfasserin
|4 aut
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|a Pan, Yupeng
|e verfasserin
|4 aut
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|a Niu, Yujuan
|e verfasserin
|4 aut
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|a Sun, Liang
|e verfasserin
|4 aut
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|a Pan, Zizhao
|e verfasserin
|4 aut
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|a Liu, Yuqi
|e verfasserin
|4 aut
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|a Tan, Li
|e verfasserin
|4 aut
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|a Xu, Xinwei
|e verfasserin
|4 aut
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|a Xu, Chen
|e verfasserin
|4 aut
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|a Luo, Guangfu
|e verfasserin
|4 aut
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|a Wang, Qing
|e verfasserin
|4 aut
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|a Wang, Hong
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 35(2023), 20 vom: 01. Mai, Seite e2211487
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:35
|g year:2023
|g number:20
|g day:01
|g month:05
|g pages:e2211487
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|u http://dx.doi.org/10.1002/adma.202211487
|3 Volltext
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