Kagias, M., Lee, S., Friedman, A. C., Zheng, T., Veysset, D., Faraon, A., & Greer, J. R. (2023). Metasurface-Enabled Holographic Lithography for Impact-Absorbing Nanoarchitected Sheets. Advanced materials (Deerfield Beach, Fla.), 35(13), . https://doi.org/10.1002/adma.202209153
Style de citation ChicagoKagias, Matias, Seola Lee, Andrew C. Friedman, Tianzhe Zheng, David Veysset, Andrei Faraon, et Julia R. Greer. "Metasurface-Enabled Holographic Lithography for Impact-Absorbing Nanoarchitected Sheets." Advanced Materials (Deerfield Beach, Fla.) 35, no. 13 (2023). https://dx.doi.org/10.1002/adma.202209153.
Style de citation MLAKagias, Matias, et al. "Metasurface-Enabled Holographic Lithography for Impact-Absorbing Nanoarchitected Sheets." Advanced Materials (Deerfield Beach, Fla.), vol. 35, no. 13, 2023.