Style de citation APA

Li, W., Guo, Y., Luo, Z., Wu, S., Han, B., Hu, W., . . . Wang, H. (2023). A Gate Programmable van der Waals Metal-Ferroelectric-Semiconductor Vertical Heterojunction Memory. Advanced materials (Deerfield Beach, Fla.), 35(5), . https://doi.org/10.1002/adma.202208266

Style de citation Chicago

Li, Wanying, et al. "A Gate Programmable Van Der Waals Metal-Ferroelectric-Semiconductor Vertical Heterojunction Memory." Advanced Materials (Deerfield Beach, Fla.) 35, no. 5 (2023). https://dx.doi.org/10.1002/adma.202208266.

Style de citation MLA

Li, Wanying, et al. "A Gate Programmable Van Der Waals Metal-Ferroelectric-Semiconductor Vertical Heterojunction Memory." Advanced Materials (Deerfield Beach, Fla.), vol. 35, no. 5, 2023.

Attention : ces citations peuvent ne pas être correctes à 100%.