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|a 10.1002/adma.202203541
|2 doi
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|a pubmed24n1159.xml
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|a (DE-627)NLM347963617
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|a (NLM)36281793
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Kim, Yeongin
|e verfasserin
|4 aut
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|a A Hemispherical Image Sensor Array Fabricated with Organic Photomemory Transistors
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|c 2023
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Completed 05.01.2023
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|a Date Revised 11.01.2023
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2022 Wiley-VCH GmbH.
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|a Hemispherical image sensors simplify lens designs, reduce optical aberrations, and improve image resolution for compact wide-field-of-view cameras. To achieve hemispherical image sensors, organic materials are promising candidates due to the following advantages: tunability of optoelectronic/spectral response and low-temperature low-cost processes. Here, a photolithographic process is developed to prepare a hemispherical image sensor array using organic thin film photomemory transistors with a density of 308 pixels per square centimeter. This design includes only one photomemory transistor as a single active pixel, in contrast to the conventional pixel architecture, consisting of select/readout/reset transistors and a photodiode. The organic photomemory transistor, comprising light-sensitive organic semiconductor and charge-trapping dielectric, is able to achieve a linear photoresponse (light intensity range, from 1 to 50 W m-2 ), along with a responsivity as high as 1.6 A W-1 (wavelength = 465 nm) for a dark current of 0.24 A m-2 (drain voltage = -1.5 V). These observed values represent the best responsivity for similar dark currents among all the reported hemispherical image sensor arrays to date. A transfer method was further developed that does not damage organic materials for hemispherical organic photomemory transistor arrays. These developed techniques are scalable and are amenable for other high-resolution 3D organic semiconductor devices
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|a Journal Article
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|a hemispherical image sensors
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|a image sensor arrays
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|a organic thin films
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|a photomemory transistors
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|a Zhu, Chenxin
|e verfasserin
|4 aut
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|a Lee, Wen-Ya
|e verfasserin
|4 aut
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|a Smith, Anna
|e verfasserin
|4 aut
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|a Ma, Haowen
|e verfasserin
|4 aut
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|a Li, Xiang
|e verfasserin
|4 aut
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|a Son, Donghee
|e verfasserin
|4 aut
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|a Matsuhisa, Naoji
|e verfasserin
|4 aut
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1 |
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|a Kim, Jaemin
|e verfasserin
|4 aut
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1 |
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|a Bae, Won-Gyu
|e verfasserin
|4 aut
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|a Cho, Sung Ho
|e verfasserin
|4 aut
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|a Kim, Myung-Gil
|e verfasserin
|4 aut
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|a Kurosawa, Tadanori
|e verfasserin
|4 aut
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|a Katsumata, Toru
|e verfasserin
|4 aut
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|a To, John W F
|e verfasserin
|4 aut
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|a Oh, Jin Young
|e verfasserin
|4 aut
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|a Paik, Seonghyun
|e verfasserin
|4 aut
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|a Kim, Soo Jin
|e verfasserin
|4 aut
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|a Jin, Lihua
|e verfasserin
|4 aut
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|a Yan, Feng
|e verfasserin
|4 aut
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|a Tok, Jeffrey B-H
|e verfasserin
|4 aut
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|a Bao, Zhenan
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 35(2023), 1 vom: 30. Jan., Seite e2203541
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:35
|g year:2023
|g number:1
|g day:30
|g month:01
|g pages:e2203541
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|u http://dx.doi.org/10.1002/adma.202203541
|3 Volltext
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|a GBV_ILN_350
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|d 35
|j 2023
|e 1
|b 30
|c 01
|h e2203541
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