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231226s2023 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202208275
|2 doi
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|a pubmed24n1159.xml
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|a (DE-627)NLM347831834
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|a (NLM)36268544
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Xie, Xuejie
|e verfasserin
|4 aut
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|a Engineering Spin Configurations of Synthetic Antiferromagnet by Controlling Long-Range Oscillatory Interlayer Coupling and Neighboring Ferrimagnetic Coupling
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|c 2023
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Completed 13.01.2023
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|a Date Revised 13.01.2023
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2022 Wiley-VCH GmbH.
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|a Controllable manipulation of specific spin configurations of magnetic materials is the key to constructing functional spintronic devices. Here, it is demonstrated by integrating the merits of ferromagnetic, ferrimagnetic, and antiferromagnetic spin configurations into one synthetic antiferromagnetic (SAF) heterostructure by controlling both long-range oscillatory interlayer coupling and neighboring ferrimagnetic coupling. A controllable manipulation of four types of spin configurations of the Pt/[Co/Pt/Co]/Ru/CoTb SAF heterostructures composed of ferromagnetic Co/Pt/Co and ferrimagnetic CoTb layers is successfully achieved. In particular, the compensated magnetization, enhanced anomalous Hall resistance in the remanence state, wide-temperature spin-orbit torque switching of magnetization, and high immunity to the external magnetic field are simultaneously obtained in one of the SAF heterojunctions with macroscopic interlayer antiferromagnetic coupling. This design concept of engineering spin configurations may enable efficient spin manipulation for customized memory and logic applications
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|a Journal Article
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|a ferrimagnetic coupling
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|a magnetization switching
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|a oscillatory interlayer coupling
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|a spin configuration
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|a synthetic antiferromagnets
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|a Wang, Xiujuan
|e verfasserin
|4 aut
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|a Wang, Wei
|e verfasserin
|4 aut
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1 |
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|a Zhao, Xiaonan
|e verfasserin
|4 aut
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1 |
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|a Bai, Lihui
|e verfasserin
|4 aut
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1 |
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|a Chen, Yanxue
|e verfasserin
|4 aut
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|a Tian, Yufeng
|e verfasserin
|4 aut
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|a Yan, Shishen
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 35(2023), 2 vom: 14. Jan., Seite e2208275
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:35
|g year:2023
|g number:2
|g day:14
|g month:01
|g pages:e2208275
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|u http://dx.doi.org/10.1002/adma.202208275
|3 Volltext
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