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231226s2023 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202206793
|2 doi
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|a pubmed25n1159.xml
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|a (DE-627)NLM347816762
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|a (NLM)36267034
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|a DE-627
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|e rakwb
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|a eng
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| 100 |
1 |
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|a Cheng, Simin
|e verfasserin
|4 aut
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|a Ultrathin Hydrogel Films toward Breathable Skin-Integrated Electronics
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|c 2023
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Completed 06.01.2023
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|a Date Revised 11.01.2023
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|a published: Print-Electronic
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|a Citation Status MEDLINE
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|a © 2022 The Authors. Advanced Materials published by Wiley-VCH GmbH.
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|a On-skin electronics that offer revolutionary capabilities in personalized diagnosis, therapeutics, and human-machine interfaces require seamless integration between the skin and electronics. A common question remains whether an ideal interface can be introduced to directly bridge thin-film electronics with the soft skin, allowing the skin to breathe freely and the skin-integrated electronics to function stably. Here, an ever-thinnest hydrogel is reported that is compliant to the glyphic lines and subtle minutiae on the skin without forming air gaps, produced by a facile cold-lamination method. The hydrogels exhibit high water-vapor permeability, allowing nearly unimpeded transepidermal water loss and free breathing of the skin underneath. Hydrogel-interfaced flexible (opto)electronics without causing skin irritation or accelerated device performance deterioration are demonstrated. The long-term applicability is recorded for over one week. With combined features of extreme mechanical compliance, high permeability, and biocompatibility, the ultrathin hydrogel interface promotes the general applicability of skin-integrated electronics
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|a Journal Article
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|a flexible (opto)electronics
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|a mechanical compliance
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|a skin-integrated electronics
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|a ultrathin hydrogels
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|a water-vapor permeability
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|a hydrogel film
|2 NLM
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|a Methylgalactosides
|2 NLM
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| 650 |
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|a Hydrogels
|2 NLM
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| 700 |
1 |
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|a Lou, Zirui
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zhang, Lan
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Guo, Haotian
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Wang, Zitian
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Guo, Chuanfei
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Fukuda, Kenjiro
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Ma, Shaohua
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Wang, Guoqing
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Someya, Takao
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Cheng, Hui-Ming
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Xu, Xiaomin
|e verfasserin
|4 aut
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| 773 |
0 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 35(2023), 1 vom: 14. Jan., Seite e2206793
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnas
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| 773 |
1 |
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|g volume:35
|g year:2023
|g number:1
|g day:14
|g month:01
|g pages:e2206793
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| 856 |
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|u http://dx.doi.org/10.1002/adma.202206793
|3 Volltext
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