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231226s2022 xx |||||o 00| ||eng c |
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|a 10.1021/acs.langmuir.2c01701
|2 doi
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|a eng
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| 100 |
1 |
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|a Xu, Jie
|e verfasserin
|4 aut
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|a Structure and Properties of Ultrathin SiOx Films on Cu(111)
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|c 2022
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Revised 20.09.2022
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a The metal-oxide interface plays a crucial role in catalysis, and it has attracted increasing interest in recent years. Cu/SiO2, as a common copper-based catalyst, has been widely used in industrial catalysis. However, it is still a challenge to clarify the structures of the interface of Cu-SiOx and the effect on catalytic performance. Herein, we prepared ultrathin SiOx films by evaporating Si onto a Cu(111) surface followed by annealing in an O2 atmosphere, which were characterized by various surface science techniques. The results showed that a SiOx film could grow nearly layer-by-layer on the Cu(111) surface in the present condition. Both X-ray photoelectron spectroscopy (XPS) and high-resolution electron energy loss spectroscopy (HREELS) results confirmed the presence of Cu-O-Si and Si-O-Si species. Thermal stability experiments illustrated that the well-ordered silica films were stable under annealing in vacuum. The feature of CO adsorption suggested a CO-Cuδ+ species induced from the Cuδ+-O-Si. Low-energy ion scattering spectroscopy (LEIS) and XPS results demonstrated that some Cu2O appeared on the surface when the 1 ML SiOx/Cu(111) was exposed in O2 at 353 K
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|a Journal Article
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1 |
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|a Mu, Changle
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Chen, Mingshu
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1985
|g 38(2022), 37 vom: 20. Sept., Seite 11414-11420
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnas
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| 773 |
1 |
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|g volume:38
|g year:2022
|g number:37
|g day:20
|g month:09
|g pages:11414-11420
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|u http://dx.doi.org/10.1021/acs.langmuir.2c01701
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|d 38
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|e 37
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|h 11414-11420
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