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231226s2022 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202200946
|2 doi
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|a pubmed24n1138.xml
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|a (DE-627)NLM341577065
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|a (NLM)35635443
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|a DE-627
|b ger
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|e rakwb
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|a eng
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| 100 |
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|a Won, Kyuyeon
|e verfasserin
|4 aut
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| 245 |
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|a Raman Scattering Measurement of Suspended Graphene under Extreme Strain Induced by Nanoindentation
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|c 2022
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|a Date Revised 27.07.2022
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2022 Wiley-VCH GmbH.
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|a Graphene is known as a superstiff and extremely strong material. Hence, applying strains greater than 1% to graphene and simultaneously measuring changes in its physical properties has been challenging because of the limited methodologies for measuring both high strain and other physical properties. Here, Raman scattering measurement of suspended graphene under extremely high biaxial strain as large as 6.1% using an atomic force microscopy (AFM)-Raman spectroscopy measurement tool is reported. Nanoindentation is performed using AFM tips machined to have a flat top and a hole shape, resulting in a strained graphene area sufficiently large to enable the acquisition of a Raman signal. At the same time, the laser light is focused on the strained flat area of the graphene membrane. The Raman signals of the G and 2D bands of graphene are redshifted by 282 and 684 cm-1 , respectively, which is unprecedented for graphene. This measurement technique provides an effective methodology to measure variations in the physical properties of atomically thin materials under superhigh strain
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|a Journal Article
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|a Raman scattering
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|a graphene
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|a nanoindentation
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|a superhigh strain
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1 |
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|a Lee, Chanwoo
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Jung, Jaehyuck
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kwon, Sanghyuk
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Gebredingle, Yisehak
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Lim, Jang Gyun
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kim, Moon Ki
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Jeong, Mun Seok
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Lee, Changgu
|e verfasserin
|4 aut
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| 773 |
0 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 34(2022), 30 vom: 24. Juli, Seite e2200946
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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| 773 |
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|g volume:34
|g year:2022
|g number:30
|g day:24
|g month:07
|g pages:e2200946
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|u http://dx.doi.org/10.1002/adma.202200946
|3 Volltext
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