Giant Negative Magnetoresistance beyond Chiral Anomaly in Topological Material YCuAs2

© 2022 Wiley-VCH GmbH.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 34(2022), 29 vom: 28. Juli, Seite e2201597
1. Verfasser: Kang, Baolei (VerfasserIn)
Weitere Verfasser: Liu, Zhao, Zhao, Dan, Zheng, Lixuan, Sun, Zeliang, Li, Jian, Wang, Zhengfei, Wu, Tao, Chen, Xianhui
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2022
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article chiral anomalies negative magnetoresistance spin-orbit coupling topological materials vacancy-induced local moments
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520 |a The large negative magnetoresistance (MR) effect, which usually emerges in various magnetic systems, is a technologically important property for spintronics. Recently, the so-called "chiral anomaly" in topological semimetals offers an alternative to generate a considerable negative MR effect without utilizing magnetism. However, it requires that the applied magnetic field must be strictly along the electric current direction, which sets a strong limit for practical applications. Here, a giant negative MR effect is discovered with a value of up to -40% in 9 T at 2 K in the nonmagnetic Dirac material YCuAs2 , which is not restricted to the specific configuration for applied magnetic fields. Based on magnetic susceptibility and NMR measurements, the giant negative MR effect is tightly connected with the unexpected spin-dependent scattering from vacancy-induced local moments, which is also beyond the classical Kondo effect. The present work not only offers an alternative route for spintronics based on nonmagnetic topological materials, but also helps to further understand the negative MR effect in topological materials 
650 4 |a Journal Article 
650 4 |a chiral anomalies 
650 4 |a negative magnetoresistance 
650 4 |a spin-orbit coupling 
650 4 |a topological materials 
650 4 |a vacancy-induced local moments 
700 1 |a Liu, Zhao  |e verfasserin  |4 aut 
700 1 |a Zhao, Dan  |e verfasserin  |4 aut 
700 1 |a Zheng, Lixuan  |e verfasserin  |4 aut 
700 1 |a Sun, Zeliang  |e verfasserin  |4 aut 
700 1 |a Li, Jian  |e verfasserin  |4 aut 
700 1 |a Wang, Zhengfei  |e verfasserin  |4 aut 
700 1 |a Wu, Tao  |e verfasserin  |4 aut 
700 1 |a Chen, Xianhui  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 34(2022), 29 vom: 28. Juli, Seite e2201597  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:34  |g year:2022  |g number:29  |g day:28  |g month:07  |g pages:e2201597 
856 4 0 |u http://dx.doi.org/10.1002/adma.202201597  |3 Volltext 
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