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231225s2022 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202109350
|2 doi
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|a pubmed24n1119.xml
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|a (DE-627)NLM335735614
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|a (NLM)35038775
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Lin, Chongjia
|e verfasserin
|4 aut
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|a A Solution-Processed Inorganic Emitter with High Spectral Selectivity for Efficient Subambient Radiative Cooling in Hot Humid Climates
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|c 2022
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Revised 24.03.2022
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2022 Wiley-VCH GmbH.
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|a Daytime radiative cooling provides an eco-friendly solution to space cooling with zero energy consumption. Despite significant advances, most state-of-the-art radiative coolers show broadband infrared emission with low spectral selectivity, which limits their cooling temperatures, especially in hot humid regions. Here, an all-inorganic narrowband emitter comprising a solution-derived SiOx Ny layer sandwiched between a reflective substrate and a self-assembly monolayer of SiO2 microspheres is reported. It shows a high and diffusive solar reflectance (96.4%) and strong infrared-selective emittance (94.6%) with superior spectral selectivity (1.46). Remarkable subambient cooling of up to 5 °C in autumn and 2.5 °C in summer are achieved under high humidity without any solar shading or convection cover at noontime in a subtropical coastal city, Hong Kong. Owing to the all-inorganic hydrophobic structure, the emitter shows outstanding resistance to ultraviolet and water in long-term durability tests. The scalable-solution-based fabrication renders this stable high-performance emitter promising for large-scale deployment in various climates
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|a Journal Article
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|a cooling temperature
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|a hot humid climates
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|a inorganic emitters
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|a selective thermal emission
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| 650 |
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4 |
|a subambient radiative cooling
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1 |
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|a Li, Yang
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Chi, Cheng
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kwon, Ye Seul
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Huang, Jingyuan
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Wu, Zuoxu
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zheng, Jiongzhi
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Liu, Gongze
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Tso, Chi Yan
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Chao, Christopher Y H
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Huang, Baoling
|e verfasserin
|4 aut
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| 773 |
0 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 34(2022), 12 vom: 03. März, Seite e2109350
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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| 773 |
1 |
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|g volume:34
|g year:2022
|g number:12
|g day:03
|g month:03
|g pages:e2109350
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|u http://dx.doi.org/10.1002/adma.202109350
|3 Volltext
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