Phase-Field Simulations of Tunable Polar Topologies in Lead-Free Ferroelectric/Paraelectric Multilayers with Ultrahigh Energy-Storage Performance

© 2022 Wiley-VCH GmbH.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 34(2022), 13 vom: 07. Apr., Seite e2108772
1. Verfasser: Liu, Yiqian (VerfasserIn)
Weitere Verfasser: Liu, Junfu, Pan, Hao, Cheng, Xiaoxing, Hong, Zijian, Xu, Ben, Chen, Long-Qing, Nan, Ce-Wen, Lin, Yuan-Hua
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2022
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article energy storage ferroelectric multilayer phase-field simulation polar topology
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520 |a Dielectric capacitors are emerging energy-storage components that require both high energy-storage density and high efficiency. The conventional approach to energy-storage enhancement is polar nanodomain engineering via chemical modification. Here, a new approach of domain engineering is proposed by exploiting the tunable polar topologies that have been observed recently in ferroelectric/paraelectric multilayer films. Using phase-field simulations, it is demonstrated that vortex, spiral, and in-plane polar structures can be stabilized in BiFeO3 /SrTiO3 (BFO/STO) multilayers by tailoring the strain state and layer thickness. Various switching dynamics are realized in these polar topologies, resulting in relaxor-ferroelectric-, antiferroelectric-, and paraelectric-like polarization behaviors, respectively. Ultrahigh energy-storage densities above 170 J cm-3 and efficiencies above 95% are achievable in STO/BFO/STO trilayers. This strategy should be generally implementable in other multilayer dielectrics and offers a new avenue to enhancing energy storage by tuning the polar topology and thus the polarization characteristics 
650 4 |a Journal Article 
650 4 |a energy storage 
650 4 |a ferroelectric 
650 4 |a multilayer 
650 4 |a phase-field simulation 
650 4 |a polar topology 
700 1 |a Liu, Junfu  |e verfasserin  |4 aut 
700 1 |a Pan, Hao  |e verfasserin  |4 aut 
700 1 |a Cheng, Xiaoxing  |e verfasserin  |4 aut 
700 1 |a Hong, Zijian  |e verfasserin  |4 aut 
700 1 |a Xu, Ben  |e verfasserin  |4 aut 
700 1 |a Chen, Long-Qing  |e verfasserin  |4 aut 
700 1 |a Nan, Ce-Wen  |e verfasserin  |4 aut 
700 1 |a Lin, Yuan-Hua  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 34(2022), 13 vom: 07. Apr., Seite e2108772  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:34  |g year:2022  |g number:13  |g day:07  |g month:04  |g pages:e2108772 
856 4 0 |u http://dx.doi.org/10.1002/adma.202108772  |3 Volltext 
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