In-situ Near-Field Probe Microscopy of Plasma Processing
There exists a great necessity for in situ nanoscale characterization of surfaces and thin films during plasma treatments. To address this need, the current approaches rely on either 'post mortem' sample microscopy, or in situ optical methods. The latter, however, lack the required nanosca...
| Veröffentlicht in: | Applied physics letters. - 1998. - 113(2018) vom: 01. |
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| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2018
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| Zugriff auf das übergeordnete Werk: | Applied physics letters |
| Schlagworte: | Journal Article Scanning probe microscopy carbon nanotubes in situ microwave impedance microscopy plasma processing |
| Online verfügbar |
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